Abstract
A two-undulator FEL (free electron laser) amplifier for the production of XUV (extreme ultraviolet) radiation by harmonics generation is analyzed in the framework of the exponential gain regime. Some criteria to design the composite undulator are then described.
Citation Formats
Dipace, A, and Sabia, E.
XUV FELs by harmonics amplification: Parametric analysis in two-undulator schemes.
Italy: N. p.,
1991.
Web.
Dipace, A, & Sabia, E.
XUV FELs by harmonics amplification: Parametric analysis in two-undulator schemes.
Italy.
Dipace, A, and Sabia, E.
1991.
"XUV FELs by harmonics amplification: Parametric analysis in two-undulator schemes."
Italy.
@misc{etde_10106863,
title = {XUV FELs by harmonics amplification: Parametric analysis in two-undulator schemes}
author = {Dipace, A, and Sabia, E}
abstractNote = {A two-undulator FEL (free electron laser) amplifier for the production of XUV (extreme ultraviolet) radiation by harmonics generation is analyzed in the framework of the exponential gain regime. Some criteria to design the composite undulator are then described.}
place = {Italy}
year = {1991}
month = {Jun}
}
title = {XUV FELs by harmonics amplification: Parametric analysis in two-undulator schemes}
author = {Dipace, A, and Sabia, E}
abstractNote = {A two-undulator FEL (free electron laser) amplifier for the production of XUV (extreme ultraviolet) radiation by harmonics generation is analyzed in the framework of the exponential gain regime. Some criteria to design the composite undulator are then described.}
place = {Italy}
year = {1991}
month = {Jun}
}