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	       <dc:title>Simple chemical vapour deposition method for depositing thin TiO/sub 2/ films</dc:title>
	       <dc:creator>Yeung, K S; Lam, Y W</dc:creator>
	       <dc:subject>14 SOLAR ENERGY; 36 MATERIALS SCIENCE; SILICON; ANTIREFLECTION COATINGS; SOLAR CELLS; FABRICATION; TITANIUM OXIDES; CHEMICAL VAPOR DEPOSITION; ELECTRICAL PROPERTIES; EXPERIMENTAL DATA; MEDIUM TEMPERATURE; REFRACTIVITY; THICKNESS; THIN FILMS; CHALCOGENIDES; CHEMICAL COATING; COATINGS; DATA; DEPOSITION; DIMENSIONS; DIRECT ENERGY CONVERTERS; ELEMENTS; EQUIPMENT; FILMS; INFORMATION; NUMERICAL DATA; OPTICAL PROPERTIES; OXIDES; OXYGEN COMPOUNDS; PHOTOELECTRIC CELLS; PHOTOVOLTAIC CELLS; PHYSICAL PROPERTIES; SEMIMETALS; SOLAR EQUIPMENT; SURFACE COATING; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; 140501* - Solar Energy Conversion- Photovoltaic Conversion; 360601 - Other Materials- Preparation & Manufacture</dc:subject>
	       <dc:subjectRelated></dc:subjectRelated>
	       <dc:description>Thin films of TiO/sub 2/ were produced at 130-250/sup 0/C by chemical vapour deposition (CVD) involving the hydrolysis of TiCl/sub 4/. An apparatus was developed which gives good control and reproducibility. The reaction takes place on a heated disc that rotates the silicon substrate. Premature reaction between the gases, TiCl/sub 4/ and water vapour is prevented by appropriate temperature control and careful design of the gas delivery system. With this apparatus the thickness of the TiO/sub 2/ films is controlled to within +-5% of the target value. Attention is also directed to reducing the pinhole density of the resulting films. The refractive index of the TiO/sub 2/ films was found to increase with increasing deposition temperature, from 2.1 at around 130/sup 0/C to 2.4 at 250/sup 0/C. From capacitance-voltage measurements the surface charge at the TiO/sub 2/-Si interface of films deposited at 200/sup 0/C was found to be negative. Hence these TiO/sub 2/ films are good antireflection coatings for n-type metal/insulator/semiconductor inversion layer solar cells.</dc:description>
	       <dcq:publisher></dcq:publisher>
	       <dcq:publisherResearch></dcq:publisherResearch>
	       <dcq:publisherAvailability></dcq:publisherAvailability>
	       <dcq:publisherSponsor></dcq:publisherSponsor>
	       <dcq:publisherCountry>Switzerland</dcq:publisherCountry>
		   <dc:contributingOrganizations></dc:contributingOrganizations>
	       <dc:date>1983-11-11</dc:date>
	       <dc:language>English</dc:language>
	       <dc:type>Journal Article</dc:type>
	       <dcq:typeQualifier></dcq:typeQualifier>
	       <dc:relation>Journal Name: Thin Solid Films; (Switzerland); Journal Volume: 109:2</dc:relation>
	       <dc:coverage></dc:coverage>
	       <dc:format>Medium: X; Size: Pages: 169-178</dc:format>
	       <dc:doi>https://doi.org/10.1016/0040-6090(83)90136-0</dc:doi>
	       <dc:identifier></dc:identifier>
		   <dc:journalName>[]</dc:journalName>
		   <dc:journalIssue></dc:journalIssue>
		   <dc:journalVolume>109:2</dc:journalVolume>
	       <dc:identifierReport></dc:identifierReport>
	       <dcq:identifierDOEcontract></dcq:identifierDOEcontract>
	       <dc:identifierOther>Journal ID: CODEN: THSFA</dc:identifierOther>
	       <dc:source>EDB-84-090557</dc:source>
	       <dc:rights></dc:rights>
	       <dc:dateEntry>2010-05-18</dc:dateEntry>
	       <dc:dateAdded></dc:dateAdded>
	       <dc:ostiId>6907089</dc:ostiId>
	       <dcq:identifier-purl></dcq:identifier-purl>
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