Deposition of Ti-C-N hard film by ion plating. Ion plating ni yoru Ti-C-N koshitsu himaku keisei Kuwano, S; Otake, T; Mano, T [Shizuoka Industrial Research Institute of Shizuoka Prefecture, Shizuoka (Japan)] 36 MATERIALS SCIENCE; CHEMICAL VAPOR DEPOSITION; CHEMICAL ACTIVATION; COATINGS; CARBON ADDITIONS; NITROGEN ADDITIONS; TITANIUM ADDITIONS; VAPOR PLATING; ION BEAMS; ACETYLENE; CRYSTALLIZATION; ELECTRON GUNS; MIXING RATIO; PHYSICAL PROPERTIES; SUBSTRATES; VICKERS HARDNESS; ALKYNES; ALLOYS; BEAMS; CHEMICAL COATING; DEPOSITION; HYDROCARBONS; ORGANIC COMPOUNDS; PHASE TRANSFORMATIONS; PLATING; SURFACE COATING; TITANIUM ALLOYS; 360101* - Metals & Alloys- Preparation & Fabrication It was attempted to develop a new film having characteristics of each of TiN and TiC by an activated reactive evaporation(ARE) process, a kind of ion plating. That is, a Ti-C-N film was formed by using titanium as evaporative source and nitrogen and acetylene gas as reactive gas. In the preliminary test for the deposition of the Ti-C-N film, a TiN film of Hv1600 was obtained. The conditions for depositing this film were as follows; electron gun output 10kV-175mA, N{sub 2} gas pressure 1{times}10{sup {minus}4}Torr, substrate heating temperature 400 centigrade, and substrate voltage 0.2kV. When the deposition of the Ti-C-N film was tried by mixing C{sub 2}H{sub 2}gas under the same conditions, hardness of the film decreased to around Hv1100-1300. As a result of the evaluation of physical properties of this film, it was found that crystallinity of the film was getting worse with the increasing ratio of mixed C{sub 2}H{sub 2} gas. It was thus recognized that the reaction of C{sub 2}H{sub 2} gas was not proceeded efficiently. 4 refs., 8 figs. Japan 1991-08-01 Japanese Journal Article Journal Name: Shizuoka-ken Shizuoka Kogyo Gijutsu Senta Kenkyu Hokoku; (Japan); Journal Volume: 36 Medium: X; Size: Pages: 127-133 https://doi.org/ [] 36 Journal ID: ISSN 0916-6572; CODEN: SSSHE NEDO; NEDO-91-950596; EDB-92-041321 2010-12-29 5723850