{
  "date" : "1991-08-01",
  "identifier_doecontract" : "",
  "subject" : "36 MATERIALS SCIENCE; CHEMICAL VAPOR DEPOSITION; CHEMICAL ACTIVATION; COATINGS; CARBON ADDITIONS; NITROGEN ADDITIONS; TITANIUM ADDITIONS; VAPOR PLATING; ION BEAMS; ACETYLENE; CRYSTALLIZATION; ELECTRON GUNS; MIXING RATIO; PHYSICAL PROPERTIES; SUBSTRATES; VICKERS HARDNESS; ALKYNES; ALLOYS; BEAMS; CHEMICAL COATING; DEPOSITION; HYDROCARBONS; ORGANIC COMPOUNDS; PHASE TRANSFORMATIONS; PLATING; SURFACE COATING; TITANIUM ALLOYS; 360101* - Metals & Alloys- Preparation & Fabrication",
  "description" : "It was attempted to develop a new film having characteristics of each of TiN and TiC by an activated reactive evaporation(ARE) process, a kind of ion plating. That is, a Ti-C-N film was formed by using titanium as evaporative source and nitrogen and acetylene gas as reactive gas. In the preliminary test for the deposition of the Ti-C-N film, a TiN film of Hv1600 was obtained. The conditions for depositing this film were as follows; electron gun output 10kV-175mA, N{sub 2} gas pressure 1{times}10{sup {minus}4}Torr, substrate heating temperature 400 centigrade, and substrate voltage 0.2kV. When the deposition of the Ti-C-N film was tried by mixing C{sub 2}H{sub 2}gas under the same conditions, hardness of the film decreased to around Hv1100-1300. As a result of the evaluation of physical properties of this film, it was found that crystallinity of the film was getting worse with the increasing ratio of mixed C{sub 2}H{sub 2} gas. It was thus recognized that the reaction of C{sub 2}H{sub 2} gas was not proceeded efficiently. 4 refs., 8 figs.",
  "language" : "Japanese",
  "identifier_report" : "",
  "publisher_sponsor" : "",
  "publisher_country" : "Japan",
  "source" : "NEDO; NEDO-91-950596; EDB-92-041321",
  "purl" : "",
  "title" : "Deposition of Ti-C-N hard film by ion plating. Ion plating ni yoru Ti-C-N koshitsu himaku keisei",
  "type" : "Journal Article",
  "subject_related" : "",
  "relation" : "Journal Name: Shizuoka-ken Shizuoka Kogyo Gijutsu Senta Kenkyu Hokoku; (Japan); Journal Volume: 36",
  "entry_date" : "2010-12-29",
  "subject_list" : [ "36 MATERIALS SCIENCE", "CHEMICAL VAPOR DEPOSITION", "CHEMICAL ACTIVATION", "COATINGS", "CARBON ADDITIONS", "NITROGEN ADDITIONS", "TITANIUM ADDITIONS", "VAPOR PLATING", "ION BEAMS", "ACETYLENE", "CRYSTALLIZATION", "ELECTRON GUNS", "MIXING RATIO", "PHYSICAL PROPERTIES", "SUBSTRATES", "VICKERS HARDNESS", "ALKYNES", "ALLOYS", "BEAMS", "CHEMICAL COATING", "DEPOSITION", "HYDROCARBONS", "ORGANIC COMPOUNDS", "PHASE TRANSFORMATIONS", "PLATING", "SURFACE COATING", "TITANIUM ALLOYS", "360101* - Metals & Alloys- Preparation & Fabrication" ],
  "publisher_availability" : "",
  "rights" : "",
  "announced_date" : "1992-04-01",
  "type_qualifier" : "",
  "has_fulltext" : false,
  "coverage" : "",
  "identifier" : "",
  "journal_volume" : "36",
  "creator" : "Kuwano, S; Otake, T; Mano, T [Shizuoka Industrial Research Institute of Shizuoka Prefecture, Shizuoka (Japan)]",
  "site_ownership_code" : "NEDO",
  "osti_id" : "5723850",
  "journal_issue" : "",
  "resource_type" : "JOUR",
  "format" : "Medium: X; Size: Pages: 127-133",
  "journal_name" : [ ],
  "contributing_organizations" : "",
  "citation_location" : "https://www.osti.gov/etdeweb/biblio/5723850",
  "publication_year" : 1991,
  "subject_list_commas" : "36 MATERIALS SCIENCE, CHEMICAL VAPOR DEPOSITION, CHEMICAL ACTIVATION, COATINGS, CARBON ADDITIONS, NITROGEN ADDITIONS, TITANIUM ADDITIONS, VAPOR PLATING, ION BEAMS, ACETYLENE, CRYSTALLIZATION, ELECTRON GUNS, MIXING RATIO, PHYSICAL PROPERTIES, SUBSTRATES, VICKERS HARDNESS, ALKYNES, ALLOYS, BEAMS, CHEMICAL COATING, DEPOSITION, HYDROCARBONS, ORGANIC COMPOUNDS, PHASE TRANSFORMATIONS, PLATING, SURFACE COATING, TITANIUM ALLOYS, 360101* - Metals & Alloys- Preparation & Fabrication",
  "publisher" : "",
  "identifier_other" : "Journal ID: ISSN 0916-6572; CODEN: SSSHE",
  "publisher_research" : "",
  "creators_list" : [ "Kuwano, S", "Otake, T", "Mano, T [Shizuoka Industrial Research Institute of Shizuoka Prefecture, Shizuoka (Japan)]" ],
  "doi" : "https://doi.org/"
}