Applications of multicomponent ion beam enhanced deposition in new film material Tao, Zhang; Tonghe, Zhang; Huixing, Zhang; Benkun, Ma [Beijing Normal Univ. (China). Inst. of Low Energy Nuclear Physics]; Guoqing, Li; Zexiang, Gong [Dalian Univ. of Technology (China). Three Beam Laboratory] 66 PHYSICS; AUGER ELECTRON SPECTROSCOPY; CHROMIUM IONS; DEPOSITION; ELECTRICAL PROPERTIES; FILMS; ION BEAMS; MATERIALS; MECHANICAL PROPERTIES; NITROGEN IONS; TRANSMISSION ELECTRON MICROSCOPY; USES; X-RAY DIFFRACTION Multicomponent ion beam enhanced deposition was used to synthesize (TiCr) N films. The films were characterized by AES, TEM and XRD methods. The electrochemical property and mechanics property of the films were measured. The experimental results show that the multicomponent ion beam enhanced deposition has stronger potential of new material development than physical vapour deposition. China 1997-09-01 Chinese Journal Article Journal Name: Nuclear Physics Review; Journal Volume: 14; Journal Issue: 3; Other Information: PBD: Sep 1997 Medium: X; Size: pp. 173-176 https://doi.org/ [] 3 14 Journal ID: XZ7774; ISSN 1007-4627; TRN: CN9702717003069 INIS; SCA: 665300; PA: AIX-29:003069; EDB-98:012605; SN: 98001900575 2010-12-29 558573