<?xml version="1.0" encoding="UTF-8" ?>
<rdf:RDF xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcq="http://purl.org/dc/terms/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#">
     <records>
	  <record>
	       <dc:title>Y thin films by ultrashort pulsed laser deposition for photocathode application</dc:title>
	       <dc:creator>Lorusso, A., E-mail: antonella.lorusso@le.infn.it [Mathematic and Physics Department, University of Salento, Via Arnesano, 73100 Lecce (Italy); National Institute of Nuclear Physics, Via Arnesano, 73100 Lecce (Italy)]; De Giorgi, M. L. [Mathematic and Physics Department, University of Salento, Via Arnesano, 73100 Lecce (Italy)]; National Institute of Nuclear Physics, Via Arnesano, 73100 Lecce (Italy)]; Fotakis, C. [Institute of Electronic Structure and Laser (IELS), Foundation of Research and Technology-Hellas (FORTH) P.O. Box 1385, Vassilika Vouton, GR-711 10 Heraklion (Greece)]; Maiolo, B.; Miglietta, P. [Mathematic and Physics Department, University of Salento, Via Arnesano, 73100 Lecce (Italy)]; Papadopoulou, E. L. [Institute of Electronic Structure and Laser (IELS), Foundation of Research and Technology-Hellas (FORTH) P.O. Box 1385, Vassilika Vouton, GR-711 10 Heraklion (Greece)]; Perrone, A. [Mathematic and Physics Department, University of Salento, Via Arnesano, 73100 Lecce (Italy)]; National Institute of Nuclear Physics, Via Arnesano, 73100 Lecce (Italy)]</dc:creator>
	       <dc:subject>75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ABLATION; DEPOSITS; ELECTRON BEAMS; ENERGY BEAM DEPOSITION; LASER RADIATION; LASERS; MORPHOLOGY; PHOTOCATHODES; PULSED IRRADIATION; PULSES; SCANNING ELECTRON MICROSCOPY; SURFACES; THIN FILMS</dc:subject>
	       <dc:subjectRelated></dc:subjectRelated>
	       <dc:description>Highlights: Black-Right-Pointing-Pointer We deposit Y thin films by pulsed laser ablation with 0.5 and 5 ps pulse durations. Black-Right-Pointing-Pointer Y thin films deposition is interesting for photocathode application. Black-Right-Pointing-Pointer Y thin films are well adherent to the substrate with a high abundance of nano-particles on the film surface. Black-Right-Pointing-Pointer Nano-particles abundance decreases as a function of the laser fluence. - Abstract: In this work, the deposition of Y thin films by laser beams with 0.5 ps and 5 ps pulse durations at different laser fluences (1.2-6.4 J/cm{sup 2}) is reported. The morphology of the deposited films and of the ablated target surface is investigated by scanning electron microscopy analyses. The present results show that the films, well adherent to the substrates, are characterized by a high abundance of sub-micrometric particulates with average size less than 0.3 {mu}m, whose density decreases with increasing laser fluence. The formation of columnar structures observed on the target surface seems to be responsible of the poor film homogeneity. Acceptable deposition rate in the range of 0.08-0.16 Angstrom-Sign /pulse with 5 ps pulse duration is found; on the contrary with 0.5 ps pulse duration, it is not possible to get information on deposition rate as a function of the laser fluence due to the high non-uniformity of the films. A comparison with the results previously obtained in ns regime is presented and discussed. The achievements of our investigation will be useful to optimize the synthesis of photocathodes based on Y films for the production of bright electron beams in radio-frequency photoinjectors.</dc:description>
	       <dcq:publisher></dcq:publisher>
	       <dcq:publisherResearch></dcq:publisherResearch>
	       <dcq:publisherAvailability>Available from http://dx.doi.org/10.1016/j.apsusc.2012.05.080</dcq:publisherAvailability>
	       <dcq:publisherSponsor></dcq:publisherSponsor>
	       <dcq:publisherCountry>Netherlands</dcq:publisherCountry>
		   <dc:contributingOrganizations></dc:contributingOrganizations>
	       <dc:date>2012-09-01</dc:date>
	       <dc:language>English</dc:language>
	       <dc:type>Journal Article</dc:type>
	       <dcq:typeQualifier></dcq:typeQualifier>
	       <dc:relation>Journal Name: Applied Surface Science; Journal Volume: 258; Journal Issue: 22; Other Information: Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)</dc:relation>
	       <dc:coverage></dc:coverage>
	       <dc:format>Medium: X; Size: page(s) 8719-8723</dc:format>
	       <dc:doi>https://doi.org/10.1016/J.APSUSC.2012.05.080</dc:doi>
	       <dc:identifier>PII: S0169-4332(12)00939-7</dc:identifier>
		   <dc:journalName>[]</dc:journalName>
		   <dc:journalIssue>22</dc:journalIssue>
		   <dc:journalVolume>258</dc:journalVolume>
	       <dc:identifierReport></dc:identifierReport>
	       <dcq:identifierDOEcontract></dcq:identifierDOEcontract>
	       <dc:identifierOther>Journal ID: ISSN 0169-4332; CODEN: ASUSEE; Other: PII: S0169-4332(12)00939-7; TRN: NL13R0152108601</dc:identifierOther>
	       <dc:source>NLN</dc:source>
	       <dc:rights></dc:rights>
	       <dc:dateEntry>2013-11-21</dc:dateEntry>
	       <dc:dateAdded></dc:dateAdded>
	       <dc:ostiId>22154467</dc:ostiId>
	       <dcq:identifier-purl></dcq:identifier-purl>
	  </record>
     </records>
</rdf:RDF>