{
  "date" : "2010-02-15",
  "identifier_doecontract" : "",
  "subject" : "75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; COUPLING; METALS; OXIDATION; SURFACES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; VANADIUM OXIDES; X-RAY DIFFRACTOMETERS; X-RAY PHOTOELECTRON SPECTROSCOPY",
  "description" : "VO{sub 2} thin film synthesized by a novel sputtering oxidation coupling (SOC) method has been successfully fabricated. The experimental results show that the optimum oxidation time is 285 s and the thin film exhibits a good metal-insulator transition (MIT) approximately at 340 K. The corresponding structures and surface compositions of the films have been characterized by X-ray diffractometer and X-ray photoelectron spectroscopy separately.",
  "language" : "English",
  "identifier_report" : "",
  "publisher_sponsor" : "",
  "publisher_country" : "Netherlands",
  "source" : "NLN",
  "purl" : "",
  "title" : "A novel sputtering oxidation coupling (SOC) method to fabricate VO{sub 2} thin film",
  "type" : "Journal Article",
  "subject_related" : "",
  "relation" : "Journal Name: Applied Surface Science; Journal Volume: 256; Journal Issue: 9; Other Information: Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA)",
  "entry_date" : "2013-04-12",
  "subject_list" : [ "75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY", "COUPLING", "METALS", "OXIDATION", "SURFACES", "TEMPERATURE RANGE 0273-0400 K", "THIN FILMS", "VANADIUM OXIDES", "X-RAY DIFFRACTOMETERS", "X-RAY PHOTOELECTRON SPECTROSCOPY" ],
  "publisher_availability" : "Available from http://dx.doi.org/10.1016/j.apsusc.2009.11.022",
  "rights" : "",
  "announced_date" : "2013-02-21",
  "type_qualifier" : "",
  "has_fulltext" : false,
  "coverage" : "",
  "identifier" : "PII: S0169-4332(09)01611-0",
  "journal_volume" : "256",
  "creator" : "Xu Xiaofeng, E-mail: xxf61@163.com [Department of Applied Physics, Donghua University, Shanghai 201620 (China)]; Anyuan, Yin [Department of Chemistry and Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, Fudan University, Shanghai 200433 (China)]; Xiliang, Du [Electronic Engineering Institute, Hei Longjiang University, Harbin 150080 (China)]; Wang Jiqing, E-mail: jqwang@ee.ecnu.edu.cn [Key Laboratory of Polarized Materials and Devices, East China Normal University, Shanghai 200062 (China)]; Jiading, Liu; Xinfeng, He; Xingxing, Liu [Department of Applied Physics, Donghua University, Shanghai 201620 (China)]; Yilong, Huan [College of Textiles, Donghua University, Shanghai 201620 (China)]",
  "site_ownership_code" : "NLN",
  "osti_id" : "22058049",
  "journal_issue" : "9",
  "resource_type" : "JOUR",
  "format" : "Medium: X; Size: page(s) 2750-2753",
  "journal_name" : [ ],
  "contributing_organizations" : "",
  "citation_location" : "https://www.osti.gov/etdeweb/biblio/22058049",
  "publication_year" : 2010,
  "subject_list_commas" : "75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY, COUPLING, METALS, OXIDATION, SURFACES, TEMPERATURE RANGE 0273-0400 K, THIN FILMS, VANADIUM OXIDES, X-RAY DIFFRACTOMETERS, X-RAY PHOTOELECTRON SPECTROSCOPY",
  "publisher" : "",
  "identifier_other" : "Journal ID: ISSN 0169-4332; CODEN: ASUSEE; Other: PII: S0169-4332(09)01611-0; TRN: NL10R0820018531",
  "publisher_research" : "",
  "creators_list" : [ "Xu Xiaofeng, E-mail: xxf61@163.com [Department of Applied Physics, Donghua University, Shanghai 201620 (China)]", "Anyuan, Yin [Department of Chemistry and Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, Fudan University, Shanghai 200433 (China)]", "Xiliang, Du [Electronic Engineering Institute, Hei Longjiang University, Harbin 150080 (China)]", "Wang Jiqing, E-mail: jqwang@ee.ecnu.edu.cn [Key Laboratory of Polarized Materials and Devices, East China Normal University, Shanghai 200062 (China)]", "Jiading, Liu", "Xinfeng, He", "Xingxing, Liu [Department of Applied Physics, Donghua University, Shanghai 201620 (China)]", "Yilong, Huan [College of Textiles, Donghua University, Shanghai 201620 (China)]" ],
  "doi" : "https://doi.org/10.1016/J.APSUSC.2009.11.022"
}