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	       <dc:title>Progress in sputtered tungsten trioxide for photoelectrode applications</dc:title>
	       <dc:creator>Marsen, Bjorn; Miller, Eric L; Paluselli, Daniela; Rocheleau, Richard E [Hawaii Natural Energy Institute, University of Hawaii at Manoa, Honolulu, HI 96822 (United States)]</dc:creator>
	       <dc:subject>14 SOLAR ENERGY; ARGON; TUNGSTEN OXIDES; TUNGSTATES; TUNGSTEN; HYDROGEN; NITROGEN; FILMS; PHOTOVOLTAIC EFFECT; CALCIUM NITRIDES; POLYCRYSTALS; OXYGEN; PHOTOCURRENTS; SILICON; DOPED MATERIALS; PHOTOELECTROCHEMICAL CELLS; ABSORPTION; RED SHIFT; COMPACTS; DEPOSITION; EFFICIENCY; EQUIPMENT; GROWTH; ILLUMINANCE; MORPHOLOGY</dc:subject>
	       <dc:subjectRelated></dc:subjectRelated>
	       <dc:description>In the context of photoelectrochemical water-splitting, tungsten oxide films have been fabricated at low processing temperatures (&lt;250{sup o}C) by reactive sputtering from tungsten targets in an argon/oxygen ambient. The films have a dense, compact morphology and show columnar growth. Amorphous and highly polycrystalline films can be produced depending on the deposition conditions; polycrystalline phases appear only at higher temperatures and under certain sputter target conditions. Large crystallites proved beneficial to photoelectrochemical performance. A maximum photocurrent of 2.7mA/cm{sup 2} (at 1.6 V vs SCE) was observed in 0.33MH{sub 3}PO{sub 4} under AM 1.5 Global illumination, exceeding published results for material fabricated at higher temperatures (in the 400-600{sup o}C range). Doping of sputtered tungsten oxide films with nitrogen results in a red-shifted absorption edge, but so far not in increased photocurrents. The maximum photocurrent of a nitrogen-doped sample was measured at 2.3mA/cm{sup 2} (at 1.6 V vs SCE). A multi-junction photoanode based on the best available sputtered WO{sub 3} film and an amorphous silicon photovoltaic device is projected to operate at 2.2% solar-to-hydrogen efficiency. (author)</dc:description>
	       <dcq:publisher></dcq:publisher>
	       <dcq:publisherResearch></dcq:publisherResearch>
	       <dcq:publisherAvailability>Available from: http://dx.doi.org/10.1016/j.ijhydene.2006.01.022</dcq:publisherAvailability>
	       <dcq:publisherSponsor></dcq:publisherSponsor>
	       <dcq:publisherCountry>United Kingdom</dcq:publisherCountry>
		   <dc:contributingOrganizations></dc:contributingOrganizations>
	       <dc:date>2007-10-15</dc:date>
	       <dc:language>English</dc:language>
	       <dc:type>Journal Article</dc:type>
	       <dcq:typeQualifier></dcq:typeQualifier>
	       <dc:relation>Journal Name: International Journal of Hydrogen Energy; Journal Volume: 32; Journal Issue: 15; Other Information: Elsevier Ltd. All rights reserved</dc:relation>
	       <dc:coverage></dc:coverage>
	       <dc:format>Medium: X; Size: page(s) 3110-3115</dc:format>
	       <dc:doi>https://doi.org/10.1016/J.IJHYDENE.2006.01.022</dc:doi>
	       <dc:identifier></dc:identifier>
		   <dc:journalName>[]</dc:journalName>
		   <dc:journalIssue>15</dc:journalIssue>
		   <dc:journalVolume>32</dc:journalVolume>
	       <dc:identifierReport></dc:identifierReport>
	       <dcq:identifierDOEcontract></dcq:identifierDOEcontract>
	       <dc:identifierOther>Journal ID: ISSN 0360-3199; IJHEDX; TRN: GB07V3618</dc:identifierOther>
	       <dc:source>GB</dc:source>
	       <dc:rights></dc:rights>
	       <dc:dateEntry>2010-01-01</dc:dateEntry>
	       <dc:dateAdded></dc:dateAdded>
	       <dc:ostiId>20969400</dc:ostiId>
	       <dcq:identifier-purl></dcq:identifier-purl>
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