{
  "date" : "2005-11-15",
  "identifier_doecontract" : "",
  "subject" : "36 MATERIALS SCIENCE; AMORPHOUS STATE; ATOMIC FORCE MICROSCOPY; CORRELATIONS; CRYSTAL GROWTH; DIELECTRIC MATERIALS; GLASS; NIOBIUM OXIDES; ROUGHNESS; SILICON OXIDES; SPUTTERING; STATISTICAL DATA; SUBSTRATES; SURFACE COATING; SURFACES; THIN FILMS",
  "description" : "We investigate the amorphous thin-film growth of SiO{sub 2} and Nb{sub 2}O{sub 5} on glass substrates and quantify the roughness of the film surface by means of a statistical data analysis of atomic force microscopy images. We determine the absolute root-mean-square roughness, the effective growth exponent {beta}, the local roughness exponent {alpha}, and the evolution of the lateral correlation length {xi}{sub a} for dual magnetron sputter-deposited thin films.",
  "language" : "English",
  "identifier_report" : "",
  "publisher_sponsor" : "",
  "publisher_country" : "United States",
  "source" : "INIS",
  "purl" : "",
  "title" : "Roughness evolution in thin-film growth of SiO{sub 2} and Nb{sub 2}O{sub 5}",
  "type" : "Journal Article",
  "subject_related" : "",
  "relation" : "Journal Name: Journal of Applied Physics; Journal Volume: 98; Journal Issue: 10; Other Information: DOI: 10.1063/1.2130521; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)",
  "entry_date" : "2010-06-03",
  "subject_list" : [ "36 MATERIALS SCIENCE", "AMORPHOUS STATE", "ATOMIC FORCE MICROSCOPY", "CORRELATIONS", "CRYSTAL GROWTH", "DIELECTRIC MATERIALS", "GLASS", "NIOBIUM OXIDES", "ROUGHNESS", "SILICON OXIDES", "SPUTTERING", "STATISTICAL DATA", "SUBSTRATES", "SURFACE COATING", "SURFACES", "THIN FILMS" ],
  "publisher_availability" : "",
  "rights" : "",
  "announced_date" : "2006-05-15",
  "type_qualifier" : "",
  "has_fulltext" : false,
  "coverage" : "",
  "identifier" : "",
  "journal_volume" : "98",
  "creator" : "Elsholz, F; Schoell, E; Scharfenorth, C; Seewald, G; Eichler, H J; Rosenfeld, A [Technische Universitaet Berlin, Institut fuer Theoretische Physik, Hardenbergstrasse 36, D-10623 Berlin (Germany)]; Technische Universitaet Berlin, Optisches Institut, Hardenbergstrasse 36, D-10623 Berlin (Germany); Max-Born-Institut, Max-Born-Strasse 2a, 12489 Berlin (Germany)]",
  "site_ownership_code" : "INIS",
  "osti_id" : "20719802",
  "journal_issue" : "10",
  "resource_type" : "JOUR",
  "format" : "Medium: X; Size: page(s) 103516-103516.7",
  "journal_name" : [ ],
  "contributing_organizations" : "",
  "citation_location" : "https://www.osti.gov/etdeweb/biblio/20719802",
  "publication_year" : 2005,
  "subject_list_commas" : "36 MATERIALS SCIENCE, AMORPHOUS STATE, ATOMIC FORCE MICROSCOPY, CORRELATIONS, CRYSTAL GROWTH, DIELECTRIC MATERIALS, GLASS, NIOBIUM OXIDES, ROUGHNESS, SILICON OXIDES, SPUTTERING, STATISTICAL DATA, SUBSTRATES, SURFACE COATING, SURFACES, THIN FILMS",
  "publisher" : "",
  "identifier_other" : "Journal ID: ISSN 0021-8979; JAPIAU; TRN: US06A8929032065",
  "publisher_research" : "",
  "creators_list" : [ "Elsholz, F", "Schoell, E", "Scharfenorth, C", "Seewald, G", "Eichler, H J", "Rosenfeld, A [Technische Universitaet Berlin, Institut fuer Theoretische Physik, Hardenbergstrasse 36, D-10623 Berlin (Germany)]", "Technische Universitaet Berlin, Optisches Institut, Hardenbergstrasse 36, D-10623 Berlin (Germany)", "Max-Born-Institut, Max-Born-Strasse 2a, 12489 Berlin (Germany)]" ],
  "doi" : "https://doi.org/10.1063/1.2130521"
}