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	       <dc:title>Synthesis of Mo{sub 2}N and Mo{sub 2-x}Ti{sub x}N thin films by ion beam enhanced deposition method and their structure and properties</dc:title>
	       <dc:creator>Bangzhi, Liu; Guoqing, Li; Zongxin, Mu; Jialiang, Zhang; Yan, Cui [The Key Natinal Laboratory for Materials Surface Modification, Dalian Univ. of Technology, Dalian (China)]; Wong, N B; Aoron, H [City Uiversity of Hong Kong (China)]</dc:creator>
	       <dc:subject>75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CORROSION RESISTANCE; DEPOSITION; ION BEAMS; MICROSTRUCTURE; MOLYBDENUM NITRIDES; NITROGEN IONS; THIN FILMS; TITANIUM IONS; TRANSMISSION ELECTRON MICROSCOPY; X-RAY DIFFRACTION</dc:subject>
	       <dc:subjectRelated></dc:subjectRelated>
	       <dc:description>Some Mo{sub 2}N and Mo{sub 2-x}Ti{sub x}N films were synthesized by N ion beam enhanced deposition and synchronized N-Ti ion beams enhanced deposition methods respectively. The microstructure of the films was determined to be of {gamma}-Mo{sub 2}N phase by the X-ray diffraction and transmission electron diffraction experiments. The scratch tests demonstrated that the metal ion beam could effectively improve adhesion of the films. The scratch critical loading of the Mo{sub 2-x}Ti{sub x}N film was measured to be about 3000 gf, which is about twice as large as that of the Mo{sub 2}N film. The corrosion resistance of the films was analyzed by the anode polarizing tests. The corrosion-self voltage and corrosion-self current of the Mo{sub 2}N film and the Mo{sub 2-x}Ti{sub x}N film in a 0.5 mol/L H{sub 2}SO{sub 4} solution were found to be 32 mV, 0.5 {mu}A/cm{sup 2} and 166 mV, 0.26 {mu}A/cm{sup 2} respectively. These results indicated that the corrosion resistance of the Mo{sub 2-x}Ti{sub x}N film was much better than that of the Mo{sub 2}N film.</dc:description>
	       <dcq:publisher></dcq:publisher>
	       <dcq:publisherResearch></dcq:publisherResearch>
	       <dcq:publisherAvailability></dcq:publisherAvailability>
	       <dcq:publisherSponsor></dcq:publisherSponsor>
	       <dcq:publisherCountry>China</dcq:publisherCountry>
		   <dc:contributingOrganizations></dc:contributingOrganizations>
	       <dc:date>2000-07-01</dc:date>
	       <dc:language>Chinese</dc:language>
	       <dc:type>Journal Article</dc:type>
	       <dcq:typeQualifier></dcq:typeQualifier>
	       <dc:relation>Journal Name: Nuclear Techniques; Journal Volume: 23; Journal Issue: 7; Other Information: PBD: Jul 2000</dc:relation>
	       <dc:coverage></dc:coverage>
	       <dc:format>Medium: X; Size: page(s) 483-487</dc:format>
	       <dc:doi>https://doi.org/</dc:doi>
	       <dc:identifier></dc:identifier>
		   <dc:journalName>[]</dc:journalName>
		   <dc:journalIssue>7</dc:journalIssue>
		   <dc:journalVolume>23</dc:journalVolume>
	       <dc:identifierReport></dc:identifierReport>
	       <dcq:identifierDOEcontract></dcq:identifierDOEcontract>
	       <dc:identifierOther>Journal ID: ISSN 0253-3219; NUTEDL; TRN: CN0102129040322</dc:identifierOther>
	       <dc:source>INIS; EDB-01:078763</dc:source>
	       <dc:rights></dc:rights>
	       <dc:dateEntry>2010-12-30</dc:dateEntry>
	       <dc:dateAdded></dc:dateAdded>
	       <dc:ostiId>20186153</dc:ostiId>
	       <dcq:identifier-purl></dcq:identifier-purl>
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