Vitreous carbon mask substrate for X-ray lithography
Abstract
The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.
- Inventors:
-
- Livermore, CA
- Fremont, CA
- Dublin, CA
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 971535
- Patent Number(s):
- 7608367
- Application Number:
- 11/192,797
- Assignee:
- Sandia Corporation (Livermore, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Aigeldinger, Georg, Skala, Dawn M, Griffiths, Stewart K, Talin, Albert Alec, Losey, Matthew W, and Yang, Chu-Yeu Peter. Vitreous carbon mask substrate for X-ray lithography. United States: N. p., 2009.
Web.
Aigeldinger, Georg, Skala, Dawn M, Griffiths, Stewart K, Talin, Albert Alec, Losey, Matthew W, & Yang, Chu-Yeu Peter. Vitreous carbon mask substrate for X-ray lithography. United States.
Aigeldinger, Georg, Skala, Dawn M, Griffiths, Stewart K, Talin, Albert Alec, Losey, Matthew W, and Yang, Chu-Yeu Peter. Tue .
"Vitreous carbon mask substrate for X-ray lithography". United States. https://www.osti.gov/servlets/purl/971535.
@article{osti_971535,
title = {Vitreous carbon mask substrate for X-ray lithography},
author = {Aigeldinger, Georg and Skala, Dawn M and Griffiths, Stewart K and Talin, Albert Alec and Losey, Matthew W and Yang, Chu-Yeu Peter},
abstractNote = {The present invention is directed to the use of vitreous carbon as a substrate material for providing masks for X-ray lithography. The new substrate also enables a small thickness of the mask absorber used to pattern the resist, and this enables improved mask accuracy. An alternative embodiment comprised the use of vitreous carbon as a LIGA substrate wherein the VC wafer blank is etched in a reactive ion plasma after which an X-ray resist is bonded. This surface treatment provides a surface enabling good adhesion of the X-ray photoresist and subsequent nucleation and adhesion of the electrodeposited metal for LIGA mold-making while the VC substrate practically eliminates secondary radiation effects that lead to delamination of the X-ray resist form the substrate, the loss of isolated resist features, and the formation of a resist layer adjacent to the substrate that is insoluble in the developer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Oct 27 00:00:00 EDT 2009},
month = {Tue Oct 27 00:00:00 EDT 2009}
}
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