Extreme-UV lithography vacuum chamber zone seal
Abstract
Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.
- Inventors:
-
- Tracy, CA
- Manteca, CA
- San Ramon, CA
- Livermore, CA
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 921441
- Patent Number(s):
- 6545745
- Application Number:
- 09/985,876
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Haney, Steven J, Herron, Donald Joe, Klebanoff, Leonard E, and Replogle, William C. Extreme-UV lithography vacuum chamber zone seal. United States: N. p., 2003.
Web.
Haney, Steven J, Herron, Donald Joe, Klebanoff, Leonard E, & Replogle, William C. Extreme-UV lithography vacuum chamber zone seal. United States.
Haney, Steven J, Herron, Donald Joe, Klebanoff, Leonard E, and Replogle, William C. Tue .
"Extreme-UV lithography vacuum chamber zone seal". United States. https://www.osti.gov/servlets/purl/921441.
@article{osti_921441,
title = {Extreme-UV lithography vacuum chamber zone seal},
author = {Haney, Steven J and Herron, Donald Joe and Klebanoff, Leonard E and Replogle, William C},
abstractNote = {Control of particle contamination on the reticle and carbon contamination of optical surfaces in photolithography systems can be achieved by the establishment of multiple pressure zones in the photolithography systems. The different zones will enclose the reticle, projection optics, wafer, and other components of system. The system includes a vacuum apparatus that includes: a housing defining a vacuum chamber; one or more metrology trays situated within the vacuum chamber each of which is supported by at least one support member, wherein the tray separates the vacuum chamber into a various compartments that are maintained at different pressures; and conductance seal devices for adjoining the perimeter of each tray to an inner surface of the housing wherein the tray is decoupled from vibrations emanating from the inner surface of the housing.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Apr 08 00:00:00 EDT 2003},
month = {Tue Apr 08 00:00:00 EDT 2003}
}