Long working distance incoherent interference microscope
Abstract
A full-field imaging, long working distance, incoherent interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. A long working distance greater than 10 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-dimensional height profiles of MEMS test structures to be acquired across an entire wafer while being actively probed, and, optionally, through a transparent window. An optically identical pair of sample and reference arm objectives is not required, which reduces the overall system cost, and also the cost and time required to change sample magnifications. Using a LED source, high magnification (e.g., 50.times.) can be obtained having excellent image quality, straight fringes, and high fringe contrast.
- Inventors:
-
- Albuquerque, NM
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 908523
- Patent Number(s):
- 7034271
- Application Number:
- 10/857,115
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 47 OTHER INSTRUMENTATION
Citation Formats
Sinclair, Michael B, and De Boer, Maarten P. Long working distance incoherent interference microscope. United States: N. p., 2006.
Web.
Sinclair, Michael B, & De Boer, Maarten P. Long working distance incoherent interference microscope. United States.
Sinclair, Michael B, and De Boer, Maarten P. Tue .
"Long working distance incoherent interference microscope". United States. https://www.osti.gov/servlets/purl/908523.
@article{osti_908523,
title = {Long working distance incoherent interference microscope},
author = {Sinclair, Michael B and De Boer, Maarten P},
abstractNote = {A full-field imaging, long working distance, incoherent interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. A long working distance greater than 10 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-dimensional height profiles of MEMS test structures to be acquired across an entire wafer while being actively probed, and, optionally, through a transparent window. An optically identical pair of sample and reference arm objectives is not required, which reduces the overall system cost, and also the cost and time required to change sample magnifications. Using a LED source, high magnification (e.g., 50.times.) can be obtained having excellent image quality, straight fringes, and high fringe contrast.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Apr 25 00:00:00 EDT 2006},
month = {Tue Apr 25 00:00:00 EDT 2006}
}
Works referenced in this record:
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Nanometer resolution of three-dimensional motions using video interference microscopy
conference, January 1999
- Hemmert, W.; Mermelstein, M. S.; Freeman, D. M.
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