Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients

Folta, James A; Montcalm, Claude; Walton, Christopher

Advanced Search OptionsAdvanced Search queries use a traditional Term Search. For more info, see our FAQ.

All Fields:

Patent Title:

Abstract:

Assignee:

Inventor(s):

Patent Number:

Patent Classification (CPC):

All Classifications
A - human necessities
A01 - agriculture
A21 - baking
A22 - butchering
A23 - foods or foodstuffs
A24 - tobacco
A41 - wearing apparel
A42 - headwear
A43 - footwear
A44 - haberdashery
A45 - hand or travelling articles
A46 - brushware
A47 - furniture
A61 - medical or veterinary science
A62 - life-saving
A63 - sports
A99 - subject matter not otherwise provided for in this section
B - performing operations
B01 - physical or chemical processes or apparatus in general
B02 - crushing, pulverising, or disintegrating
B03 - separation of solid materials using liquids or using pneumatic tables or jigs
B04 - centrifugal apparatus or machines for carrying-out physical or chemical processes
B05 - spraying or atomising in general
B06 - generating or transmitting mechanical vibrations in general
B07 - separating solids from solids
B08 - cleaning
B09 - disposal of solid waste
B21 - mechanical metal-working without essentially removing material
B22 - casting
B23 - machine tools
B24 - grinding
B25 - hand tools
B26 - hand cutting tools
B27 - working or preserving wood or similar material
B28 - working cement, clay, or stone
B29 - working of plastics
B30 - presses
B31 - making articles of paper, cardboard or material worked in a manner analogous to paper
B32 - layered products
B33 - additive manufacturing technology
B41 - printing
B42 - bookbinding
B43 - writing or drawing implements
B44 - decorative arts
B60 - vehicles in general
B61 - railways
B62 - land vehicles for travelling otherwise than on rails
B63 - ships or other waterborne vessels
B64 - aircraft
B65 - conveying
B66 - hoisting
B67 - opening, closing {or cleaning} bottles, jars or similar containers
B68 - saddlery
B81 - microstructural technology
B82 - nanotechnology
B99 - subject matter not otherwise provided for in this section
C - chemistry
C01 - inorganic chemistry
C02 - treatment of water, waste water, sewage, or sludge
C03 - glass
C04 - cements
C05 - fertilisers
C06 - explosives
C07 - organic chemistry
C08 - organic macromolecular compounds
C09 - dyes
C10 - petroleum, gas or coke industries
C11 - animal or vegetable oils, fats, fatty substances or waxes
C12 - biochemistry
C13 - sugar industry
C14 - skins
C21 - metallurgy of iron
C22 - metallurgy
C23 - coating metallic material
C25 - electrolytic or electrophoretic processes
C30 - crystal growth
C40 - combinatorial technology
C99 - subject matter not otherwise provided for in this section
D - textiles
D01 - natural or man-made threads or fibres
D02 - yarns
D03 - weaving
D04 - braiding
D05 - sewing
D06 - treatment of textiles or the like
D07 - ropes
D10 - indexing scheme associated with sublasses of section d, relating to textiles
D21 - paper-making
D99 - subject matter not otherwise provided for in this section
E - fixed constructions
E01 - construction of roads, railways, or bridges
E02 - hydraulic engineering
E03 - water supply
E04 - building
E05 - locks
E06 - doors, windows, shutters, or roller blinds in general
E21 - earth drilling
E99 - subject matter not otherwise provided for in this section
F - mechanical engineering
F01 - machines or engines in general
F02 - combustion engines
F03 - machines or engines for liquids
F04 - positive - displacement machines for liquids
F05 - indexing schemes relating to engines or pumps in various subclasses of classes f01-f04
F15 - fluid-pressure actuators
F16 - engineering elements and units
F17 - storing or distributing gases or liquids
F21 - lighting
F22 - steam generation
F23 - combustion apparatus
F24 - heating
F25 - refrigeration or cooling
F26 - drying
F27 - furnaces
F28 - heat exchange in general
F41 - weapons
F42 - ammunition
F99 - subject matter not otherwise provided for in this section
G - physics
G01 - measuring
G02 - optics
G03 - photography
G04 - horology
G05 - controlling
G06 - computing
G07 - checking-devices
G08 - signalling
G09 - education
G10 - musical instruments
G11 - information storage
G12 - instrument details
G16 - information and communication technology [ict] specially adapted for specific application fields
G21 - nuclear physics
G99 - subject matter not otherwise provided for in this section
H - electricity
H01 - basic electric elements
H02 - generation
H03 - basic electronic circuitry
H04 - electric communication technique
H05 - electric techniques not otherwise provided for
H99 - subject matter not otherwise provided for in this section
Y - new / cross sectional technologies
Y02 - technologies or applications for mitigation or adaptation against climate change
Y04 - information or communication technologies having an impact on other technology areas
Y10 - technical subjects covered by former uspc

More Options ...

Title: Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients

Abstract

A method and system for producing a thin film with highly uniform (or highly accurate custom graded) thickness on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source with controlled (and generally, time-varying) velocity. In preferred embodiments, the method includes the steps of measuring the source flux distribution (using a test piece that is held stationary while exposed to the source), calculating a set of predicted film thickness profiles, each film thickness profile assuming the measured flux distribution and a different one of a set of sweep velocity modulation recipes, and determining from the predicted film thickness profiles a sweep velocity modulation recipe which is adequate to achieve a predetermined thickness profile. Aspects of the invention include a practical method of accurately measuring source flux distribution, and a computer-implemented method employing a graphical user interface to facilitate convenient selection of an optimal or nearly optimal sweep velocity modulation recipe to achieve a desired thickness profile on a substrate. Preferably, the computer implements an algorithm in which many sweep velocity function parameters (for example, the speed at which each substrate spins about its center as it sweeps across the source)more » can be varied or set to zero. « less

Inventors:

Folta, James A ^[1]; Montcalm, Claude ^[2]; Walton, Christopher ^[3]

2262 Hampton Rd., Livermore, CA 94550
14 Jami St., Livermore, CA 94550
2927 Lorina St., #2, Berkeley, CA 94705-1852

Issue Date:: Wed Jan 01 00:00:00 EST 2003

Research Org.:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

OSTI Identifier:: 875071

Patent Number(s):: 6524449

Assignee:: Folta; James A. (2262 Hampton Rd., Livermore, CA 94550); Montcalm; Claude (14 Jami St., Livermore, CA 94550); Walton; Christopher (2927 Lorina St., #2, Berkeley, CA 94705-1852)

Patent Classifications (CPCs):: C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

Show more

C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C14/54 - Controlling or regulating the coating process
C23C14/543 - {using measurement on the vapor source}
C23C14/545 - {using measurement on deposited material}

G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B1/10 - Optical coatings produced by application to, or surface treatment of, optical elements

Show less

DOE Contract Number:: W-7405-ENG-48

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: method; producing; sputtered; films; sub-angstrom; thickness; uniformity; custom; gradients; film; highly; uniform; accurate; graded; flat; substrate; concave; convex; optics; sweeping; vapor; deposition; source; controlled; time-varying; velocity; embodiments; steps; measuring; flux; distribution; piece; held; stationary; exposed; calculating; set; predicted; profiles; profile; assuming; measured; sweep; modulation; recipes; determining; recipe; adequate; achieve; predetermined; aspects; practical; accurately; computer-implemented; employing; graphical; user; interface; facilitate; convenient; selection; optimal; nearly; computer; implements; algorithm; function; parameters; example; speed; spins; center; sweeps; varied; zero; vapor deposition; film thickness; highly uniform; /204/118/427/700/

Citation Formats


                    Folta, James A, Montcalm, Claude, and Walton, Christopher. Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients.  United States: N. p., 2003. 
        Web.

Copy to clipboard


                    Folta, James A, Montcalm, Claude, & Walton, Christopher. Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients.  United States.

Copy to clipboard


                    Folta, James A, Montcalm, Claude, and Walton, Christopher. Wed .  
        "Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients".  United States.  https://www.osti.gov/servlets/purl/875071.

Copy to clipboard


                    
@article{osti_875071,

  title        = {Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients},

  author       = {Folta, James A and Montcalm, Claude and Walton, Christopher},

  abstractNote = {A method and system for producing a thin film with highly uniform (or highly accurate custom graded) thickness on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source with controlled (and generally, time-varying) velocity. In preferred embodiments, the method includes the steps of measuring the source flux distribution (using a test piece that is held stationary while exposed to the source), calculating a set of predicted film thickness profiles, each film thickness profile assuming the measured flux distribution and a different one of a set of sweep velocity modulation recipes, and determining from the predicted film thickness profiles a sweep velocity modulation recipe which is adequate to achieve a predetermined thickness profile. Aspects of the invention include a practical method of accurately measuring source flux distribution, and a computer-implemented method employing a graphical user interface to facilitate convenient selection of an optimal or nearly optimal sweep velocity modulation recipe to achieve a desired thickness profile on a substrate. Preferably, the computer implements an algorithm in which many sweep velocity function parameters (for example, the speed at which each substrate spins about its center as it sweeps across the source) can be varied or set to zero.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Wed Jan 01 00:00:00 EST 2003},

  month        = {Wed Jan 01 00:00:00 EST 2003}

}

Copy to clipboard

Patent:

Save / Share:

Export Metadata

Save to My Library

Works referenced in this record:

Multilayer coating of 10X projection optics for extreme ultraviolet lithography
conference, June 1999

Montcalm, Claude; Spiller, Eberhard A.; Wedowski, Marco
Microlithography '99, SPIE Proceedings
https://doi.org/10.1117/12.351157

Advances in multilayer reflective coatings for extreme ultraviolet lithography
conference, June 1999

Folta, James A.; Bajt, Sasa; Barbee, Jr., Troy W.
Microlithography '99, SPIE Proceedings
https://doi.org/10.1117/12.351156

Design and performance of graded multilayers as focusing elements for x-ray optics
journal, August 1999

Morawe, Ch.; Pecci, P.; Peffen, J. Ch.
Review of Scientific Instruments, Vol. 70, Issue 8
https://doi.org/10.1063/1.1149897

Multilayer reflective coatings for extreme-ultraviolet lithography
conference, June 1998

Montcalm, Claude; Bajt, Sasa; Mirkarimi, Paul B.
23rd Annual International Symposium on Microlithography, SPIE Proceedings
https://doi.org/10.1117/12.309600

Similar Records in DOE Patents and OSTI.GOV collections:

Dynamic mask for producing uniform or graded-thickness thin films

Patent Folta, James A [Livermore, CA]

A method for producing single layer or multilayer films with high thickness uniformity or thickness gradients. The method utilizes a moving mask which blocks some of the flux from a sputter target or evaporation source before it deposits on a substrate. The velocity and position of the mask is computer controlled to precisely tailor the film thickness distribution. The method is applicable to any type of vapor deposition system, but is particularly useful for ion beam sputter deposition and evaporation deposition; and enables a high degree of uniformity for ion beam deposition, even for near-normal incidence of deposition species, whichmore » « less
Full Text Available
Method for making thick and/or thin film

Patent Pham, Ai Quoc; Glass, Robert S.

A method to make thick or thin films a very low cost. The method is generally similar to the conventional tape casting techniques while being more flexible and versatile. The invention involves preparing a slip (solution) of desired material and including solvents such as ethanol and an appropriate dispersant to prevent agglomeration. The slip is then sprayed on a substrate to be coated using an atomizer which spreads the slip in a fine mist. Upon hitting the substrate, the solvent evaporates, leaving a green tape containing the powder and other additives, whereafter the tape may be punctured, cut, and heatedmore » « less
Full Text Available
Method for producing thin film electrodes

Patent Narayanan, Manoj; Ma, Beihai; Balachandran, Uthamalingam; ...

The invention provides for A method for producing pure phase strontium ruthenium oxide films, the method comprising solubilizing ruthenium-containing and strontium-containing compounds to create a mixture; subjecting the mixture to a first temperature above that necessary for forming RuO.sub.2 while simultaneously preventing formation of RuO.sub.2; maintaining the first temperature for a time to remove organic compounds from the mixture, thereby forming a substantially dry film; and subjecting the film to a second temperature for time sufficient to crystallize the film. Also provided is pure phase material comprising strontium ruthenium oxide wherein the material contains no RuO.sub.2.
Full Text Available
Methods for producing thin film charge selective transport layers

Patent Hammond, Scott Ryan; Olson, Dana C.; van Hest, Marinus Franciscus Antonius Maria

Methods for producing thin film charge selective transport layers are provided. In one embodiment, a method for forming a thin film charge selective transport layer comprises: providing a precursor solution comprising a metal containing reactive precursor material dissolved into a complexing solvent; depositing the precursor solution onto a surface of a substrate to form a film; and forming a charge selective transport layer on the substrate by annealing the film.
Full Text Available
Optically transparent, superhydrophobic, biocompatible thin film coatings and methods for producing same

Patent Armstrong, Beth L.; Aytug, Tolga; Paranthaman, Mariappan Parans; ...

An optically transparent, hydrophobic coating, exhibiting an average contact angle of at least 100 degrees with a drop of water. The coating can be produced using low-cost, environmentally friendly components. Methods of preparing and using the optically transparent, hydrophobic coating.
Full Text Available

Similar Records

Title: Method and system for producing sputtered thin films with sub-angstrom thickness uniformity or custom thickness gradients

Abstract

Citation Formats

Multilayer coating of 10X projection optics for extreme ultraviolet lithography conference, June 1999

Advances in multilayer reflective coatings for extreme ultraviolet lithography conference, June 1999

Design and performance of graded multilayers as focusing elements for x-ray optics journal, August 1999

Multilayer reflective coatings for extreme-ultraviolet lithography conference, June 1998

Multilayer coating of 10X projection optics for extreme ultraviolet lithography
conference, June 1999

Advances in multilayer reflective coatings for extreme ultraviolet lithography
conference, June 1999

Design and performance of graded multilayers as focusing elements for x-ray optics
journal, August 1999

Multilayer reflective coatings for extreme-ultraviolet lithography
conference, June 1998