Surface preparation of substances for continuous convective assembly of fine particles
Abstract
A method for producing periodic nanometer-scale arrays of metal or semiconductor junctions on a clean semiconductor substrate surface is provided comprising the steps of: etching the substrate surface to make it hydrophilic, forming, under an inert atmosphere, a crystalline colloid layer on the substrate surface, depositing a metal or semiconductor material through the colloid layer onto the surface of the substrate, and removing the colloid from the substrate surface. The colloid layer is grown on the clean semiconductor surface by withdrawing the semiconductor substrate from a sol of colloid particles.
- Inventors:
-
- Rochester, MN
- Issue Date:
- Research Org.:
- California Institute of Technology (CalTech), Pasadena, CA (United States)
- OSTI Identifier:
- 875057
- Patent Number(s):
- 6521541
- Assignee:
- California Institute of Technology (Pasadena, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B05 - SPRAYING OR ATOMISING IN GENERAL B05D - PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- FG03-88ER13932
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- surface; preparation; substances; continuous; convective; assembly; fine; particles; method; producing; periodic; nanometer-scale; arrays; metal; semiconductor; junctions; clean; substrate; provided; comprising; steps; etching; hydrophilic; forming; inert; atmosphere; crystalline; colloid; layer; depositing; material; removing; grown; withdrawing; sol; semiconductor material; substrate surface; inert atmosphere; semiconductor surface; fine particle; semiconductor junction; /438/427/
Citation Formats
Rossi, Robert. Surface preparation of substances for continuous convective assembly of fine particles. United States: N. p., 2003.
Web.
Rossi, Robert. Surface preparation of substances for continuous convective assembly of fine particles. United States.
Rossi, Robert. Wed .
"Surface preparation of substances for continuous convective assembly of fine particles". United States. https://www.osti.gov/servlets/purl/875057.
@article{osti_875057,
title = {Surface preparation of substances for continuous convective assembly of fine particles},
author = {Rossi, Robert},
abstractNote = {A method for producing periodic nanometer-scale arrays of metal or semiconductor junctions on a clean semiconductor substrate surface is provided comprising the steps of: etching the substrate surface to make it hydrophilic, forming, under an inert atmosphere, a crystalline colloid layer on the substrate surface, depositing a metal or semiconductor material through the colloid layer onto the surface of the substrate, and removing the colloid from the substrate surface. The colloid layer is grown on the clean semiconductor surface by withdrawing the semiconductor substrate from a sol of colloid particles.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Jan 01 00:00:00 EST 2003},
month = {Wed Jan 01 00:00:00 EST 2003}
}
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