Extreme-UV electrical discharge source

Fornaciari, Neal R; Nygren, Richard E; Ulrickson, Michael A

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Title: Extreme-UV electrical discharge source

Abstract

An extreme ultraviolet and soft x-ray radiation electric capillary discharge source that includes a boron nitride housing defining a capillary bore that is positioned between two electrodes one of which is connected to a source of electric potential can generate a high EUV and soft x-ray radiation flux from the capillary bore outlet with minimal debris. The electrode that is positioned adjacent the capillary bore outlet is typically grounded. Pyrolytic boron nitride, highly oriented pyrolytic boron nitride, and cubic boron nitride are particularly suited. The boron nitride capillary bore can be configured as an insert that is encased in an exterior housing that is constructed of a thermally conductive material. Positioning the ground electrode sufficiently close to the capillary bore outlet also reduces bore erosion.

Inventors:

Fornaciari, Neal R ^[1]; Nygren, Richard E ^[2]; Ulrickson, Michael A ^[3]

Tracey, CA
Los Ranchos de Albuquerque, NM
Albuquerque, NM

Issue Date:: Tue Jan 01 00:00:00 EST 2002

Research Org.:: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)

OSTI Identifier:: 874281

Patent Number(s):: 6356618

Assignee:: EUV LLC (Santa Clara, CA)

Patent Classifications (CPCs):: H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE

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H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05G - X-RAY TECHNIQUE
H05G2/003 - {being produced from a liquid or gas}

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DOE Contract Number:: AC04-94AL85000

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: extreme-uv; electrical; discharge; source; extreme; ultraviolet; soft; x-ray; radiation; electric; capillary; boron; nitride; housing; defining; bore; positioned; electrodes; connected; potential; generate; euv; flux; outlet; minimal; debris; electrode; adjacent; typically; grounded; pyrolytic; highly; oriented; cubic; suited; configured; insert; encased; exterior; constructed; thermally; conductive; material; positioning; ground; sufficiently; close; reduces; erosion; boron nitride; conductive material; extreme ultraviolet; x-ray radiation; housing defining; /378/372/

Citation Formats


                    Fornaciari, Neal R, Nygren, Richard E, and Ulrickson, Michael A. Extreme-UV electrical discharge source.  United States: N. p., 2002. 
        Web.

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                    Fornaciari, Neal R, Nygren, Richard E, & Ulrickson, Michael A. Extreme-UV electrical discharge source.  United States.

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                    Fornaciari, Neal R, Nygren, Richard E, and Ulrickson, Michael A. Tue .  
        "Extreme-UV electrical discharge source".  United States.  https://www.osti.gov/servlets/purl/874281.

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@article{osti_874281,

  title        = {Extreme-UV electrical discharge source},

  author       = {Fornaciari, Neal R and Nygren, Richard E and Ulrickson, Michael A},

  abstractNote = {An extreme ultraviolet and soft x-ray radiation electric capillary discharge source that includes a boron nitride housing defining a capillary bore that is positioned between two electrodes one of which is connected to a source of electric potential can generate a high EUV and soft x-ray radiation flux from the capillary bore outlet with minimal debris. The electrode that is positioned adjacent the capillary bore outlet is typically grounded. Pyrolytic boron nitride, highly oriented pyrolytic boron nitride, and cubic boron nitride are particularly suited. The boron nitride capillary bore can be configured as an insert that is encased in an exterior housing that is constructed of a thermally conductive material. Positioning the ground electrode sufficiently close to the capillary bore outlet also reduces bore erosion.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Tue Jan 01 00:00:00 EST 2002},

  month        = {Tue Jan 01 00:00:00 EST 2002}

}

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Works referenced in this record:

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region
journal, January 1998

Klosner, M. A.; Silfvast, W. T.
Optics Letters, Vol. 23, Issue 20
https://doi.org/10.1364/OL.23.001609

Structure and low-temperature thermal conductivity of pyrolytic boron nitride
journal, August 1992

Duclaux, L.; Nysten, B.; Issi, J-P.
Physical Review B, Vol. 46, Issue 6
https://doi.org/10.1103/PhysRevB.46.3362

Effects of MeV ion irradiation of thin cubic boron nitride films
journal, March 1998

Ullmann, J.; Baglin, J. E. E.; Kellock, A. J.
Journal of Applied Physics, Vol. 83, Issue 6
https://doi.org/10.1063/1.367053

Compression Annealing of Pyrolytic Boron Nitride
journal, March 1969

Moore, A. W.
Nature, Vol. 221, Issue 5186
https://doi.org/10.1038/2211133a0

High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography
conference, June 1999

Silfvast, William T.; Klosner, M.; Shimkaveg, Gregory M.
Microlithography '99, SPIE Proceedings
https://doi.org/10.1117/12.351098

High-power extreme-ultraviolet source based on gas jets
conference, June 1998

Kubiak, Glenn D.; Bernardez II, Luis J.; Krenz, Kevin D.
23rd Annual International Symposium on Microlithography, SPIE Proceedings
https://doi.org/10.1117/12.309560

Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography
conference, June 1998

Mirkarimi, Paul B.; Montcalm, Claude
23rd Annual International Symposium on Microlithography, SPIE Proceedings
https://doi.org/10.1117/12.309565

Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography
journal, January 1997

Klosner, M. A.; Bender, H. A.; Silfvast, W. T.
Optics Letters, Vol. 22, Issue 1
https://doi.org/10.1364/OL.22.000034

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Similar Records

Title: Extreme-UV electrical discharge source

Abstract

Citation Formats

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region journal, January 1998

Structure and low-temperature thermal conductivity of pyrolytic boron nitride journal, August 1992

Effects of MeV ion irradiation of thin cubic boron nitride films journal, March 1998

Compression Annealing of Pyrolytic Boron Nitride journal, March 1969

High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography conference, June 1999

High-power extreme-ultraviolet source based on gas jets conference, June 1998

Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography conference, June 1998

Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography journal, January 1997

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region
journal, January 1998

Structure and low-temperature thermal conductivity of pyrolytic boron nitride
journal, August 1992

Effects of MeV ion irradiation of thin cubic boron nitride films
journal, March 1998

Compression Annealing of Pyrolytic Boron Nitride
journal, March 1969

High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography
conference, June 1999

High-power extreme-ultraviolet source based on gas jets
conference, June 1998

Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography
conference, June 1998

Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography
journal, January 1997