Phase-shifting point diffraction interferometer mask designs
Abstract
In a phase-shifting point diffraction interferometer, different image-plane mask designs can improve the operation of the interferometer. By keeping the test beam window of the mask small compared to the separation distance between the beams, the problem of energy from the reference beam leaking through the test beam window is reduced. By rotating the grating and mask 45.degree., only a single one-dimensional translation stage is required for phase-shifting. By keeping two reference pinholes in the same orientation about the test beam window, only a single grating orientation, and thus a single one-dimensional translation stage, is required. The use of a two-dimensional grating allows for a multiplicity of pinholes to be used about the pattern of diffracted orders of the grating at the mask. Orientation marks on the mask can be used to orient the device and indicate the position of the reference pinholes.
- Inventors:
-
- Berkeley, CA
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 874077
- Patent Number(s):
- 6307635
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- phase-shifting; diffraction; interferometer; mask; designs; image-plane; improve; operation; keeping; beam; window; compared; separation; distance; beams; energy; reference; leaking; reduced; rotating; grating; 45degree; single; one-dimensional; translation; stage; required; pinholes; orientation; two-dimensional; allows; multiplicity; pattern; diffracted; marks; orient; device; indicate; position; diffraction interferometer; /356/
Citation Formats
Goldberg, Kenneth Alan. Phase-shifting point diffraction interferometer mask designs. United States: N. p., 2001.
Web.
Goldberg, Kenneth Alan. Phase-shifting point diffraction interferometer mask designs. United States.
Goldberg, Kenneth Alan. Mon .
"Phase-shifting point diffraction interferometer mask designs". United States. https://www.osti.gov/servlets/purl/874077.
@article{osti_874077,
title = {Phase-shifting point diffraction interferometer mask designs},
author = {Goldberg, Kenneth Alan},
abstractNote = {In a phase-shifting point diffraction interferometer, different image-plane mask designs can improve the operation of the interferometer. By keeping the test beam window of the mask small compared to the separation distance between the beams, the problem of energy from the reference beam leaking through the test beam window is reduced. By rotating the grating and mask 45.degree., only a single one-dimensional translation stage is required for phase-shifting. By keeping two reference pinholes in the same orientation about the test beam window, only a single grating orientation, and thus a single one-dimensional translation stage, is required. The use of a two-dimensional grating allows for a multiplicity of pinholes to be used about the pattern of diffracted orders of the grating at the mask. Orientation marks on the mask can be used to orient the device and indicate the position of the reference pinholes.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2001},
month = {Mon Jan 01 00:00:00 EST 2001}
}
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