Constricted glow discharge plasma source
Abstract
A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.
- Inventors:
-
- Albany, CA
- San Leandro, CA
- Berkeley, CA
- Winnetka, IL
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 873337
- Patent Number(s):
- 6137231
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- constricted; glow; discharge; plasma; source; chamber; method; disclosed; polarity; geometry; set; contamination; energy; discharged; minimized; sources; mounted; parallel; series; provide; sustained; ultra; below; practical; detection; limits; suitable; applying; films; nitrides; gallium; nitride; oxides; tungsten; oxide; enriching; substances; material; surfaces; oxygen; water; vapor; difficult; process; devices; methods; assist; deposition; metal; providing; low-energy; argon; metal films; metal film; constricted glow; gallium nitride; plasma source; water vapor; glow discharge; material surface; discharge plasma; tungsten oxide; detection limits; discharge chamber; material surfaces; detection limit; /315/118/313/
Citation Formats
Anders, Andre, Anders, Simone, Dickinson, Michael, Rubin, Michael, and Newman, Nathan. Constricted glow discharge plasma source. United States: N. p., 2000.
Web.
Anders, Andre, Anders, Simone, Dickinson, Michael, Rubin, Michael, & Newman, Nathan. Constricted glow discharge plasma source. United States.
Anders, Andre, Anders, Simone, Dickinson, Michael, Rubin, Michael, and Newman, Nathan. Sat .
"Constricted glow discharge plasma source". United States. https://www.osti.gov/servlets/purl/873337.
@article{osti_873337,
title = {Constricted glow discharge plasma source},
author = {Anders, Andre and Anders, Simone and Dickinson, Michael and Rubin, Michael and Newman, Nathan},
abstractNote = {A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}
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