Null test fourier domain alignment technique for phase-shifting point diffraction interferometer
Abstract
Alignment technique for calibrating a phase-shifting point diffraction interferometer involves three independent steps where the first two steps independently align the image points and pinholes in rotation and separation to a fixed reference coordinate system, e.g, CCD. Once the two sub-elements have been properly aligned to the reference in two parameters (separation and orientation), the third step is to align the two sub-element coordinate systems to each other in the two remaining parameters (x,y) using standard methods of locating the pinholes relative to some easy to find reference point.
- Inventors:
-
- 5239 Miles Ave., Apt. A, Oakland, CA 94618
- 1622 Oxford St., #5t, Berkeley, CA 94709
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- OSTI Identifier:
- 873207
- Patent Number(s):
- 6111646
- Assignee:
- Naulleau, Patrick (5239 Miles Ave., Apt. A, Oakland, CA 94618);Goldberg, Kenneth Alan (1622 Oxford St., #5t, Berkeley, CA 94709)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS
G - PHYSICS G01 - MEASURING G01M - TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES
- DOE Contract Number:
- AC03-76SF00098
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- fourier; domain; alignment; technique; phase-shifting; diffraction; interferometer; calibrating; involves; independent; steps; independently; align; image; pinholes; rotation; separation; fixed; reference; coordinate; ccd; sub-elements; properly; aligned; parameters; orientation; third; step; sub-element; systems; remaining; standard; methods; locating; relative; easy; third step; diffraction interferometer; properly aligned; fixed reference; alignment technique; /356/
Citation Formats
Naulleau, Patrick, and Goldberg, Kenneth Alan. Null test fourier domain alignment technique for phase-shifting point diffraction interferometer. United States: N. p., 2000.
Web.
Naulleau, Patrick, & Goldberg, Kenneth Alan. Null test fourier domain alignment technique for phase-shifting point diffraction interferometer. United States.
Naulleau, Patrick, and Goldberg, Kenneth Alan. Sat .
"Null test fourier domain alignment technique for phase-shifting point diffraction interferometer". United States. https://www.osti.gov/servlets/purl/873207.
@article{osti_873207,
title = {Null test fourier domain alignment technique for phase-shifting point diffraction interferometer},
author = {Naulleau, Patrick and Goldberg, Kenneth Alan},
abstractNote = {Alignment technique for calibrating a phase-shifting point diffraction interferometer involves three independent steps where the first two steps independently align the image points and pinholes in rotation and separation to a fixed reference coordinate system, e.g, CCD. Once the two sub-elements have been properly aligned to the reference in two parameters (separation and orientation), the third step is to align the two sub-element coordinate systems to each other in the two remaining parameters (x,y) using standard methods of locating the pinholes relative to some easy to find reference point.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}
Works referenced in this record:
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journal, November 1995
- Anderson, Erik H.
- Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 13, Issue 6
Phase-shifting point diffraction interferometer
journal, January 1996
- Medecki, H.; Tejnil, E.; Goldberg, K. A.
- Optics Letters, Vol. 21, Issue 19
Effect of intensity error correlation on the computed phase of phase-shifting interferometry
journal, January 1990
- Brophy, Chris P.
- Journal of the Optical Society of America A, Vol. 7, Issue 4
Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
conference, June 1998
- Naulleau, Patrick P.; Goldberg, Kenneth A.; Lee, Sang Hun
- 23rd Annual International Symposium on Microlithography, SPIE Proceedings