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Title: Doping of germanium and silicon crystals with non-hydrogenic acceptors for far infrared lasers

Abstract

A method for doping semiconductors used for far infrared lasers with non-hydrogenic acceptors having binding energies larger than the energy of the laser photons. Doping of germanium or silicon crystals with beryllium, zinc or copper. A far infrared laser comprising germanium crystals doped with double or triple acceptor dopants permitting the doped laser to be tuned continuously from 1 to 4 terahertz and to operate in continuous mode. A method for operating semiconductor hole population inversion lasers with a closed cycle refrigerator.

Inventors:
 [1];  [2]
  1. Berkeley, CA
  2. Berlin, DE
Issue Date:
Research Org.:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
OSTI Identifier:
872800
Patent Number(s):
6011810
Assignee:
Regents of University of California (Oakland, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01S - DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
doping; germanium; silicon; crystals; non-hydrogenic; acceptors; infrared; lasers; method; semiconductors; binding; energies; larger; energy; laser; photons; beryllium; zinc; copper; comprising; doped; double; triple; acceptor; dopants; permitting; tuned; continuously; terahertz; operate; continuous; mode; operating; semiconductor; population; inversion; closed; cycle; refrigerator; silicon crystal; infrared laser; population inversion; closed cycle; binding energies; laser comprising; non-hydrogenic acceptors; crystals doped; infrared lasers; cycle refrigerator; doping semiconductor; doped laser; /372/257/

Citation Formats

Haller, Eugene E, and Brundermann, Erik. Doping of germanium and silicon crystals with non-hydrogenic acceptors for far infrared lasers. United States: N. p., 2000. Web.
Haller, Eugene E, & Brundermann, Erik. Doping of germanium and silicon crystals with non-hydrogenic acceptors for far infrared lasers. United States.
Haller, Eugene E, and Brundermann, Erik. Sat . "Doping of germanium and silicon crystals with non-hydrogenic acceptors for far infrared lasers". United States. https://www.osti.gov/servlets/purl/872800.
@article{osti_872800,
title = {Doping of germanium and silicon crystals with non-hydrogenic acceptors for far infrared lasers},
author = {Haller, Eugene E and Brundermann, Erik},
abstractNote = {A method for doping semiconductors used for far infrared lasers with non-hydrogenic acceptors having binding energies larger than the energy of the laser photons. Doping of germanium or silicon crystals with beryllium, zinc or copper. A far infrared laser comprising germanium crystals doped with double or triple acceptor dopants permitting the doped laser to be tuned continuously from 1 to 4 terahertz and to operate in continuous mode. A method for operating semiconductor hole population inversion lasers with a closed cycle refrigerator.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}

Works referenced in this record:

Stimulated far-infrared emission from copper-doped germanium crystals
journal, March 1997


Miniaturization of p  ‐Ge lasers: Progress toward continuous wave operation
journal, March 1996


Double acceptor doped Ge: A new medium for inter‐valence‐band lasers
journal, May 1996


Polarization of the far‐infrared laser oscillation in p ‐Ge in Faraday configuration
journal, November 1987