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Title: Method of fabricating boron containing coatings

Abstract

Hard coatings are fabricated from boron nitride, cubic boron nitride, and multilayer boron/cubic boron nitride, and the fabrication thereof involves magnetron sputtering in a selected atmosphere. These hard coatings may be applied to tools and engine and other parts, as well to reduce wear on tribological surfaces and electronic devices. These boron coatings contain no morphological growth features. For example, the boron is formed in an inert (e.g. argon) atmosphere, while the cubic boron nitride is formed in a reactive (e.g. nitrogen) atmosphere. The multilayer boron/cubic boron nitride, is produced by depositing alternate layers of boron and cubic boron nitride, with the alternate layers having a thickness of 1 nanometer to 1 micrometer, and at least the interfaces of the layers may be discrete or of a blended or graded composition.

Inventors:
 [1];  [1]
  1. Livermore, CA
Issue Date:
Research Org.:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
OSTI Identifier:
872264
Patent Number(s):
5897751
Assignee:
Regents of University of California (Oakland, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
method; fabricating; boron; containing; coatings; hard; fabricated; nitride; cubic; multilayer; fabrication; involves; magnetron; sputtering; selected; atmosphere; applied; tools; engine; reduce; wear; tribological; surfaces; electronic; devices; contain; morphological; growth; features; example; formed; inert; argon; reactive; nitrogen; produced; depositing; alternate; layers; thickness; nanometer; micrometer; interfaces; discrete; blended; graded; composition; magnetron sputter; morphological growth; magnetron sputtering; cubic boron; boron containing; alternate layers; boron nitride; electronic devices; selected atmosphere; reduce wear; multilayer boron; hard coatings; growth features; electronic device; hard coating; graded composition; depositing alternate; fabricating boron; involves magnetron; /204/

Citation Formats

Makowiecki, Daniel M, and Jankowski, Alan F. Method of fabricating boron containing coatings. United States: N. p., 1999. Web.
Makowiecki, Daniel M, & Jankowski, Alan F. Method of fabricating boron containing coatings. United States.
Makowiecki, Daniel M, and Jankowski, Alan F. Fri . "Method of fabricating boron containing coatings". United States. https://www.osti.gov/servlets/purl/872264.
@article{osti_872264,
title = {Method of fabricating boron containing coatings},
author = {Makowiecki, Daniel M and Jankowski, Alan F},
abstractNote = {Hard coatings are fabricated from boron nitride, cubic boron nitride, and multilayer boron/cubic boron nitride, and the fabrication thereof involves magnetron sputtering in a selected atmosphere. These hard coatings may be applied to tools and engine and other parts, as well to reduce wear on tribological surfaces and electronic devices. These boron coatings contain no morphological growth features. For example, the boron is formed in an inert (e.g. argon) atmosphere, while the cubic boron nitride is formed in a reactive (e.g. nitrogen) atmosphere. The multilayer boron/cubic boron nitride, is produced by depositing alternate layers of boron and cubic boron nitride, with the alternate layers having a thickness of 1 nanometer to 1 micrometer, and at least the interfaces of the layers may be discrete or of a blended or graded composition.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 01 00:00:00 EST 1999},
month = {Fri Jan 01 00:00:00 EST 1999}
}