Phase-shifting point diffraction interferometer

Medecki, Hector

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Title: Phase-shifting point diffraction interferometer

Abstract

Disclosed is a point diffraction interferometer for evaluating the quality of a test optic. In operation, the point diffraction interferometer includes a source of radiation, the test optic, a beam divider, a reference wave pinhole located at an image plane downstream from the test optic, and a detector for detecting an interference pattern produced between a reference wave emitted by the pinhole and a test wave emitted from the test optic. The beam divider produces separate reference and test beams which focus at different laterally separated positions on the image plane. The reference wave pinhole is placed at a region of high intensity (e.g., the focal point) for the reference beam. This allows reference wave to be produced at a relatively high intensity. Also, the beam divider may include elements for phase shifting one or both of the reference and test beams.

Inventors:

Medecki, Hector ^[1]

Berkeley, CA

Issue Date:: Thu Jan 01 00:00:00 EST 1998

Research Org.:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

OSTI Identifier:: 871971

Patent Number(s):: 5835217

Assignee:: Regents of University of California (Oakland, CA)

Patent Classifications (CPCs):: G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT

G - PHYSICS G01 - MEASURING G01M - TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES

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G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT
G01J9/02 - by interferometric methods

G - PHYSICS G01 - MEASURING G01M - TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES
G01M11/0271 - {by using interferometric methods}

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/706 - {Aberration measurement

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DOE Contract Number:: AC03-76SF00098

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: phase-shifting; diffraction; interferometer; disclosed; evaluating; quality; optic; operation; source; radiation; beam; divider; reference; wave; pinhole; located; image; plane; downstream; detector; detecting; interference; pattern; produced; emitted; produces; separate; beams; focus; laterally; separated; positions; placed; region; intensity; focal; allows; relatively; elements; phase; shifting; image plane; interference pattern; diffraction interferometer; phase shifting; phase shift; reference beam; reference wave; beam divider; pattern produced; /356/

Citation Formats


                    Medecki, Hector. Phase-shifting point diffraction interferometer.  United States: N. p., 1998. 
        Web.

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                    Medecki, Hector. Phase-shifting point diffraction interferometer.  United States.

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                    Medecki, Hector. Thu .  
        "Phase-shifting point diffraction interferometer".  United States.  https://www.osti.gov/servlets/purl/871971.

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@article{osti_871971,

  title        = {Phase-shifting point diffraction interferometer},

  author       = {Medecki, Hector},

  abstractNote = {Disclosed is a point diffraction interferometer for evaluating the quality of a test optic. In operation, the point diffraction interferometer includes a source of radiation, the test optic, a beam divider, a reference wave pinhole located at an image plane downstream from the test optic, and a detector for detecting an interference pattern produced between a reference wave emitted by the pinhole and a test wave emitted from the test optic. The beam divider produces separate reference and test beams which focus at different laterally separated positions on the image plane. The reference wave pinhole is placed at a region of high intensity (e.g., the focal point) for the reference beam. This allows reference wave to be produced at a relatively high intensity. Also, the beam divider may include elements for phase shifting one or both of the reference and test beams.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Thu Jan 01 00:00:00 EST 1998},

  month        = {Thu Jan 01 00:00:00 EST 1998}

}

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