Acoustic-wave sensor for ambient monitoring of a photoresist-stripping agent
Abstract
The acoustic-wave sensor. The acoustic-wave sensor is designed for ambient or vapor-phase monitoring of a photoresist-stripping agent such as N-methylpyrrolidinone (NMP), ethoxyethylpropionate (EEP) or the like. The acoustic-wave sensor comprises an acoustic-wave device such as a surface-acoustic-wave (SAW) device, a flexural-plate-wave (FPW) device, an acoustic-plate-mode (APM) device, or a thickness-shear-mode (TSM) device (also termed a quartz crystal microbalance or QCM) having a sensing region on a surface thereof. The sensing region includes a sensing film for sorbing a quantity of the photoresist-stripping agent, thereby altering or shifting a frequency of oscillation of an acoustic wave propagating through the sensing region for indicating an ambient concentration of the agent. According to preferred embodiments of the invention, the acoustic-wave device is a SAW device; and the sensing film comprises poly(vinylacetate), poly(N-vinylpyrrolidinone), or poly(vinylphenol).
- Inventors:
-
- Los Lunas, NM
- Albuquerque, NM
- Cedar Crest, NM
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- OSTI Identifier:
- 871788
- Patent Number(s):
- 5795993
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- acoustic-wave; sensor; ambient; monitoring; photoresist-stripping; agent; designed; vapor-phase; n-methylpyrrolidinone; nmp; ethoxyethylpropionate; comprises; device; surface-acoustic-wave; flexural-plate-wave; fpw; acoustic-plate-mode; apm; thickness-shear-mode; tsm; termed; quartz; crystal; microbalance; qcm; sensing; region; surface; film; sorbing; quantity; altering; shifting; frequency; oscillation; acoustic; wave; propagating; indicating; concentration; according; preferred; embodiments; poly; vinylacetate; n-vinylpyrrolidinone; vinylphenol; acoustic-wave device; preferred embodiments; acoustic wave; preferred embodiment; quartz crystal; sensor comprises; acoustic-wave sensor; film comprises; wave device; sensing film; photoresist-stripping agent; crystal microbalance; phase monitor; comprises poly; wave sensor; /73/
Citation Formats
Pfeifer, Kent B, Hoyt, Andrea E, and Frye, Gregory C. Acoustic-wave sensor for ambient monitoring of a photoresist-stripping agent. United States: N. p., 1998.
Web.
Pfeifer, Kent B, Hoyt, Andrea E, & Frye, Gregory C. Acoustic-wave sensor for ambient monitoring of a photoresist-stripping agent. United States.
Pfeifer, Kent B, Hoyt, Andrea E, and Frye, Gregory C. Thu .
"Acoustic-wave sensor for ambient monitoring of a photoresist-stripping agent". United States. https://www.osti.gov/servlets/purl/871788.
@article{osti_871788,
title = {Acoustic-wave sensor for ambient monitoring of a photoresist-stripping agent},
author = {Pfeifer, Kent B and Hoyt, Andrea E and Frye, Gregory C},
abstractNote = {The acoustic-wave sensor. The acoustic-wave sensor is designed for ambient or vapor-phase monitoring of a photoresist-stripping agent such as N-methylpyrrolidinone (NMP), ethoxyethylpropionate (EEP) or the like. The acoustic-wave sensor comprises an acoustic-wave device such as a surface-acoustic-wave (SAW) device, a flexural-plate-wave (FPW) device, an acoustic-plate-mode (APM) device, or a thickness-shear-mode (TSM) device (also termed a quartz crystal microbalance or QCM) having a sensing region on a surface thereof. The sensing region includes a sensing film for sorbing a quantity of the photoresist-stripping agent, thereby altering or shifting a frequency of oscillation of an acoustic wave propagating through the sensing region for indicating an ambient concentration of the agent. According to preferred embodiments of the invention, the acoustic-wave device is a SAW device; and the sensing film comprises poly(vinylacetate), poly(N-vinylpyrrolidinone), or poly(vinylphenol).},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 1998},
month = {Thu Jan 01 00:00:00 EST 1998}
}
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