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Title: Chemical vapor deposition of mullite coatings

Abstract

This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.

Inventors:
 [1];  [2]
  1. Lexington, MA
  2. Boston, MA
Issue Date:
Research Org.:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
OSTI Identifier:
871606
Patent Number(s):
5763008
Assignee:
Trustees of Boston University (Boston, MA)
Patent Classifications (CPCs):
C - CHEMISTRY C04 - CEMENTS C04B - LIME, MAGNESIA
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AC05-84OR21400
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
chemical; vapor; deposition; mullite; coatings; directed; creation; crystalline; uniform; microstructure; cvd; process; comprises; steps; establishing; flow; reactants; yield; reactor; depositing; coating; reactant; dense; thickness; uniform thickness; chemical vapor; vapor deposition; process comprises; reactant flow; mullite coatings; form microstructure; /427/

Citation Formats

Sarin, Vinod, and Mulpuri, Rao. Chemical vapor deposition of mullite coatings. United States: N. p., 1998. Web.
Sarin, Vinod, & Mulpuri, Rao. Chemical vapor deposition of mullite coatings. United States.
Sarin, Vinod, and Mulpuri, Rao. Thu . "Chemical vapor deposition of mullite coatings". United States. https://www.osti.gov/servlets/purl/871606.
@article{osti_871606,
title = {Chemical vapor deposition of mullite coatings},
author = {Sarin, Vinod and Mulpuri, Rao},
abstractNote = {This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 1998},
month = {Thu Jan 01 00:00:00 EST 1998}
}

Works referenced in this record:

Glass formation and phase transformations in plasma prepared Al2O3-SiO2 powders
journal, May 1977


The Deposition and Physical Properties of Aluminosilicate Films
journal, January 1970


Technique for Producing Mullite and Other Mixed-Oxide Systems
journal, October 1991


Mullite for Structural, Electronic, and Optical Applications
journal, October 1991