Chemical vapor deposition of mullite coatings
Abstract
This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.
- Inventors:
-
- Lexington, MA
- Boston, MA
- Issue Date:
- Research Org.:
- Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
- OSTI Identifier:
- 871606
- Patent Number(s):
- 5763008
- Assignee:
- Trustees of Boston University (Boston, MA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C04 - CEMENTS C04B - LIME, MAGNESIA
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- AC05-84OR21400
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- chemical; vapor; deposition; mullite; coatings; directed; creation; crystalline; uniform; microstructure; cvd; process; comprises; steps; establishing; flow; reactants; yield; reactor; depositing; coating; reactant; dense; thickness; uniform thickness; chemical vapor; vapor deposition; process comprises; reactant flow; mullite coatings; form microstructure; /427/
Citation Formats
Sarin, Vinod, and Mulpuri, Rao. Chemical vapor deposition of mullite coatings. United States: N. p., 1998.
Web.
Sarin, Vinod, & Mulpuri, Rao. Chemical vapor deposition of mullite coatings. United States.
Sarin, Vinod, and Mulpuri, Rao. Thu .
"Chemical vapor deposition of mullite coatings". United States. https://www.osti.gov/servlets/purl/871606.
@article{osti_871606,
title = {Chemical vapor deposition of mullite coatings},
author = {Sarin, Vinod and Mulpuri, Rao},
abstractNote = {This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 01 00:00:00 EST 1998},
month = {Thu Jan 01 00:00:00 EST 1998}
}
Works referenced in this record:
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journal, October 1991
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Mullite for Structural, Electronic, and Optical Applications
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