Molecular engineering of porous silica using aryl templates
Abstract
A process for manipulating the porosity of silica using a series of organic template groups covalently incorporated into the silicate matrix. The templates in the bridged polysilsesquioxanes are selectively removed from the material by oxidation with oxygen plasma or other means, leaving engineered voids or pores. The size of these pores is dependent upon the length or size of the template or spacer. The size of the templates is measured in terms of Si-Si distances which range from about 0.67 nm to 1.08 nm. Changes introduced by the loss of the templates result in a narrow range of micropores (i.e. <2 nm). Both aryl and alkyl template groups are used as spacers. Novel microporous silica materials useful as molecular seives, dessicants, and catalyst supports are produced.
- Inventors:
-
- Albuquerque, NM
- Irvine, CA
- Issue Date:
- Research Org.:
- AT&T
- OSTI Identifier:
- 869355
- Patent Number(s):
- 5321102
- Assignee:
- United States of America as represented by Department of Energy (Washington, DC)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
C - CHEMISTRY C01 - INORGANIC CHEMISTRY C01B - NON-METALLIC ELEMENTS
- DOE Contract Number:
- AC04-76DP00789
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- molecular; engineering; porous; silica; aryl; templates; process; manipulating; porosity; series; organic; template; covalently; incorporated; silicate; matrix; bridged; polysilsesquioxanes; selectively; removed; material; oxidation; oxygen; plasma; means; leaving; engineered; voids; pores; size; dependent; length; spacer; measured; terms; si-si; distances; range; 67; nm; 08; changes; introduced; loss; result; narrow; micropores; alkyl; spacers; novel; microporous; materials; useful; seives; dessicants; catalyst; supports; produced; porous silica; catalyst support; selectively removed; materials useful; oxygen plasma; selectively remove; narrow range; catalyst supports; organic template; silicate matrix; /525/528/
Citation Formats
Loy, Douglas A, and Shea, Kenneth J. Molecular engineering of porous silica using aryl templates. United States: N. p., 1994.
Web.
Loy, Douglas A, & Shea, Kenneth J. Molecular engineering of porous silica using aryl templates. United States.
Loy, Douglas A, and Shea, Kenneth J. Sat .
"Molecular engineering of porous silica using aryl templates". United States. https://www.osti.gov/servlets/purl/869355.
@article{osti_869355,
title = {Molecular engineering of porous silica using aryl templates},
author = {Loy, Douglas A and Shea, Kenneth J},
abstractNote = {A process for manipulating the porosity of silica using a series of organic template groups covalently incorporated into the silicate matrix. The templates in the bridged polysilsesquioxanes are selectively removed from the material by oxidation with oxygen plasma or other means, leaving engineered voids or pores. The size of these pores is dependent upon the length or size of the template or spacer. The size of the templates is measured in terms of Si-Si distances which range from about 0.67 nm to 1.08 nm. Changes introduced by the loss of the templates result in a narrow range of micropores (i.e. <2 nm). Both aryl and alkyl template groups are used as spacers. Novel microporous silica materials useful as molecular seives, dessicants, and catalyst supports are produced.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 1994},
month = {Sat Jan 01 00:00:00 EST 1994}
}
Works referenced in this record:
Template removal from molecular sieves by low-temperature plasma calcination
journal, January 1990
- Maesen, Theo L. M.; Kouwenhoven, Herman W.; van Bekkum, Herman
- Journal of the Chemical Society, Faraday Transactions, Vol. 86, Issue 23
Aryl-bridged polysilsesquioxanes--new microporous materials
journal, November 1989
- Shea, Kenneth J.; Loy, Douglas A.; Webster, Owen W.
- Chemistry of Materials, Vol. 1, Issue 6