Method of chemical vapor deposition of boron nitride using polymeric cyanoborane

Maya, Leon

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Title: Method of chemical vapor deposition of boron nitride using polymeric cyanoborane

Abstract

Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film.

Inventors:

Maya, Leon ^[1]

Oak Ridge, TN

Issue Date:: Sat Jan 01 00:00:00 EST 1994

Research Org.:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

OSTI Identifier:: 869353

Patent Number(s):: 5320878

Assignee:: Martin Marietta Energy Systems, Inc. (Oak Ridge, TN)

Patent Classifications (CPCs):: C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL

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C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
C23C16/342 - {Boron nitride}

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DOE Contract Number:: AC05-84OR21400

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: method; chemical; vapor; deposition; boron; nitride; polymeric; cyanoborane; volatilized; decomposed; thermal; microwave; plasma; energy; deposited; substrate; amorphous; film; containing; nitrogen; carbon; residual; removed; ammonia; treatment; increased; temperature; producing; adherent; essentially; stoichiometric; amorphous film; nitride film; chemical vapor; boron nitride; vapor deposition; microwave plasma; residual carbon; film containing; plasma energy; increased temperature; polymeric cyanoborane; containing boron; /427/

Citation Formats


                    Maya, Leon. Method of chemical vapor deposition of boron nitride using polymeric cyanoborane.  United States: N. p., 1994. 
        Web.

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                    Maya, Leon. Method of chemical vapor deposition of boron nitride using polymeric cyanoborane.  United States.

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                    Maya, Leon. Sat .  
        "Method of chemical vapor deposition of boron nitride using polymeric cyanoborane".  United States.  https://www.osti.gov/servlets/purl/869353.

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@article{osti_869353,

  title        = {Method of chemical vapor deposition of boron nitride using polymeric cyanoborane},

  author       = {Maya, Leon},

  abstractNote = {Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Sat Jan 01 00:00:00 EST 1994},

  month        = {Sat Jan 01 00:00:00 EST 1994}

}

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Works referenced in this record:

Polymeric Cyanoborane, (CNBH2)n: Single Source for Chemical Vapor Deposition of Boron Nitride Films
journal, February 1991

Maya, Leon; Richards, Hugh L.
Journal of the American Ceramic Society, Vol. 74, Issue 2
https://doi.org/10.1111/j.1151-2916.1991.tb06895.x

Hexagonal boron nitride: Fabrication, properties and applications
journal, January 1989

Lipp, A.; Schwetz, K. A.; Hunold, K.
Journal of the European Ceramic Society, Vol. 5, Issue 1
https://doi.org/10.1016/0955-2219(89)90003-4

Preparation, properties and applications of boron nitride thin films
journal, February 1988

Arya, S. P. S.; D'Amico, A.
Thin Solid Films, Vol. 157, Issue 2
https://doi.org/10.1016/0040-6090(88)90008-9

Similar Records in DOE Patents and OSTI.GOV collections:

Method of chemical vapor deposition of boron nitride using polymeric cyanoborane

Patent Maya, L

Polymeric cyanoborane is volatilized, decomposed by thermal or microwave plasma energy, and deposited on a substrate as an amorphous film containing boron, nitrogen and carbon. Residual carbon present in the film is removed by ammonia treatment at an increased temperature, producing an adherent, essentially stoichiometric boron nitride film. 11 figs.
Plasma-enhanced chemical vapor deposition of boron nitride using polymeric cyanoborane as source

Journal Article Maya, L [Oak Ridge National Lab., TN (United States). Chemistry Div.] - Journal of the American Ceramic Society; (United States)

The plasma-enhanced chemical vapor deposition (PECVD) of boron nitride films was studied using polymeric cyanoborane, (CNBH[sub 2])n, a material previously examined by thermally activated CVD. The PECVD procedure yields boron nitride coatings containing [approx]20 wt % paracyanogen as a contaminant. This impurity can be removed by heat treatment under vacuum or in an ammonia atmosphere. The boron nitride coatings are hexagonal and appear to be boron deficient. The PECVD process takes place at 300 C, measured at the backside of the substrate, as compared with 600 C in the thermally activated CVD process.
DOI: https://doi.org/10.1111/j.1151-2916.1992.tb07229.x
Polymeric cyanoborane (CNBH sub 2 ) sub n; Single source for chemical vapor deposition of boron nitride films

Journal Article Richards, H L; Maya, L [Chemistry Div., Oak Ridge National Lab., Oak Ridge, TN (US)] - Journal of the American Ceramic Society; (United States)

Polymeric cyanoborane, z(CHBH{sub 2}){sub n9} is a material readily prepared by passing hydrogen chloride through an ether suspension of sodium cyanotrihydroborate. This polymeric material was volatilized in a CVD reactor to produce, at 600{degrees}C, amorphous films containing boron, nitrogen, and carbon. Residual carbon present in the films was removed by ammonia treatment at 800{degrees}C, producing nearly stoichiometric boron nitride films that were adherent to a variety of substrates including silicon.
Forming iron nitride hard magnetic materials using chemical vapor deposition or liquid phase epitaxy

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A hard magnetic material includes α″ Fe16N2. In some examples, the hard magnetic material may be formed by a technique utilizing chemical vapor deposition or liquid phase epitaxy.
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Forming iron nitride hard magnetic materials using chemical vapor deposition or liquid phase epitaxy

Patent Wang, Jian-Ping; Jiang, YanFeng

The disclosure describes techniques for forming hard magnetic materials including α″-Fe16N2 using chemical vapor deposition or liquid phase epitaxy and hard materials formed according to these techniques. A method comprises heating an iron source to form a vapor comprising an iron-containing compound; depositing iron from the vapor comprising the iron-containing compound and nitrogen from a vapor comprising a nitrogen-containing compound on a substrate to form a layer comprising iron and nitrogen; and annealing the layer comprising iron and nitrogen to form at least some crystals comprising α″-Fe16N2.
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Similar Records

Title: Method of chemical vapor deposition of boron nitride using polymeric cyanoborane

Abstract

Citation Formats

Polymeric Cyanoborane, (CNBH2)n: Single Source for Chemical Vapor Deposition of Boron Nitride Films journal, February 1991

Hexagonal boron nitride: Fabrication, properties and applications journal, January 1989

Preparation, properties and applications of boron nitride thin films journal, February 1988

Polymeric Cyanoborane, (CNBH2)n: Single Source for Chemical Vapor Deposition of Boron Nitride Films
journal, February 1991

Hexagonal boron nitride: Fabrication, properties and applications
journal, January 1989

Preparation, properties and applications of boron nitride thin films
journal, February 1988