Method of sputter etching a surface
Abstract
The surface of a target is textured by co-sputter etching the target surface with a seed material adjacent thereto, while the target surface is maintained at a pre-selected temperature. By pre-selecting the temperature of the surface while sputter etching, it is possible to predetermine the reflectance properties of the etched surface. The surface may be textured to absorb sunlight efficiently and have minimal emittance in the infrared region so as to be well-suited for use as a solar absorber for photothermal energy conversion.
- Inventors:
-
- (Seattle, WA)
- Issue Date:
- Research Org.:
- Battelle Memorial Institute, Columbus, OH (United States)
- OSTI Identifier:
- 864875
- Patent Number(s):
- 4431499
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23F - NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE
F - MECHANICAL ENGINEERING F24 - HEATING F24S - SOLAR HEAT COLLECTORS
- DOE Contract Number:
- AC06-76RL01830
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- method; sputter; etching; surface; target; textured; co-sputter; seed; material; adjacent; thereto; maintained; pre-selected; temperature; pre-selecting; predetermine; reflectance; properties; etched; absorb; sunlight; efficiently; minimal; emittance; infrared; region; well-suited; solar; absorber; photothermal; energy; conversion; adjacent thereto; thermal energy; energy conversion; target surface; selected temperature; seed material; solar absorber; etched surface; sputter etching; infrared region; /204/
Citation Formats
Henager, Jr., Charles H. Method of sputter etching a surface. United States: N. p., 1984.
Web.
Henager, Jr., Charles H. Method of sputter etching a surface. United States.
Henager, Jr., Charles H. Sun .
"Method of sputter etching a surface". United States. https://www.osti.gov/servlets/purl/864875.
@article{osti_864875,
title = {Method of sputter etching a surface},
author = {Henager, Jr., Charles H.},
abstractNote = {The surface of a target is textured by co-sputter etching the target surface with a seed material adjacent thereto, while the target surface is maintained at a pre-selected temperature. By pre-selecting the temperature of the surface while sputter etching, it is possible to predetermine the reflectance properties of the etched surface. The surface may be textured to absorb sunlight efficiently and have minimal emittance in the infrared region so as to be well-suited for use as a solar absorber for photothermal energy conversion.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sun Jan 01 00:00:00 EST 1984},
month = {Sun Jan 01 00:00:00 EST 1984}
}
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