Plasma generating device with hairpin-shaped cathode filaments
Abstract
A device for generating a homogeneous ion-electron plasma from which a large ion beam can be extracted. The device utilizes hairpin-shaped filaments lining at least portions of the wall of the chamber which have been rotated 90 degrees from prior known approaches. This provides a very significant result in that the DC current flowing through the filaments produces a small solenoidal magnetic field that impedes the emitted electrons from striking the walls of the chamber, which may be of a cylindrical or rectangular configuration. This improves the efficiency of the ion source and provides additional space for more filaments, while providing a very uniform plasma density profile which is noise-free.
- Inventors:
-
- Alamo, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 863292
- Patent Number(s):
- 4140943
- Assignee:
- United States of America as represented by United States (Washington, DC)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- plasma; generating; device; hairpin-shaped; cathode; filaments; homogeneous; ion-electron; beam; extracted; utilizes; lining; portions; wall; chamber; rotated; 90; degrees; prior; approaches; provides; significant; result; dc; current; flowing; produces; solenoidal; magnetic; field; impedes; emitted; electrons; striking; walls; cylindrical; rectangular; configuration; improves; efficiency; source; additional; space; providing; uniform; density; profile; noise-free; provides additional; density profile; plasma density; uniform plasma; device utilizes; magnetic field; current flow; current flowing; dc current; rectangular configuration; plasma generating; shaped cathode; generating device; emitted electrons; /376/313/315/
Citation Formats
Ehlers, Kenneth W. Plasma generating device with hairpin-shaped cathode filaments. United States: N. p., 1979.
Web.
Ehlers, Kenneth W. Plasma generating device with hairpin-shaped cathode filaments. United States.
Ehlers, Kenneth W. Mon .
"Plasma generating device with hairpin-shaped cathode filaments". United States. https://www.osti.gov/servlets/purl/863292.
@article{osti_863292,
title = {Plasma generating device with hairpin-shaped cathode filaments},
author = {Ehlers, Kenneth W},
abstractNote = {A device for generating a homogeneous ion-electron plasma from which a large ion beam can be extracted. The device utilizes hairpin-shaped filaments lining at least portions of the wall of the chamber which have been rotated 90 degrees from prior known approaches. This provides a very significant result in that the DC current flowing through the filaments produces a small solenoidal magnetic field that impedes the emitted electrons from striking the walls of the chamber, which may be of a cylindrical or rectangular configuration. This improves the efficiency of the ion source and provides additional space for more filaments, while providing a very uniform plasma density profile which is noise-free.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 1979},
month = {Mon Jan 01 00:00:00 EST 1979}
}
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