Systems and methods for perforation and ohmic contact formation for GaN epitaxial lift-off using an etch stop layer
Abstract
Methods and systems for forming a device structure free of a substrate are described. Exemplary embodiments include a device structure comprising of device layers, a release layer, an etch stop layer, and a substrate. The device structure is exposed to photoenhanced wet etch environments to vertically and laterally etch the release layer to separate the device layers from the substrate. The device structure can include a contact layer, an etch stop layer, or both in some embodiments.
- Inventors:
- Issue Date:
- Research Org.:
- MicroLink Devices, Inc., Niles, IL (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1600452
- Patent Number(s):
- 10522363
- Application Number:
- 16/044,479
- Assignee:
- MicroLink Devices, Inc. (Niles, IL)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AR0000446
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 07/24/2018
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
Citation Formats
Youtsey, Christopher, McCarthy, Robert Fabian, and Reddy, Rekha. Systems and methods for perforation and ohmic contact formation for GaN epitaxial lift-off using an etch stop layer. United States: N. p., 2019.
Web.
Youtsey, Christopher, McCarthy, Robert Fabian, & Reddy, Rekha. Systems and methods for perforation and ohmic contact formation for GaN epitaxial lift-off using an etch stop layer. United States.
Youtsey, Christopher, McCarthy, Robert Fabian, and Reddy, Rekha. Tue .
"Systems and methods for perforation and ohmic contact formation for GaN epitaxial lift-off using an etch stop layer". United States. https://www.osti.gov/servlets/purl/1600452.
@article{osti_1600452,
title = {Systems and methods for perforation and ohmic contact formation for GaN epitaxial lift-off using an etch stop layer},
author = {Youtsey, Christopher and McCarthy, Robert Fabian and Reddy, Rekha},
abstractNote = {Methods and systems for forming a device structure free of a substrate are described. Exemplary embodiments include a device structure comprising of device layers, a release layer, an etch stop layer, and a substrate. The device structure is exposed to photoenhanced wet etch environments to vertically and laterally etch the release layer to separate the device layers from the substrate. The device structure can include a contact layer, an etch stop layer, or both in some embodiments.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Dec 31 00:00:00 EST 2019},
month = {Tue Dec 31 00:00:00 EST 2019}
}
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