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Title: Simple method to fabricate nano-porous diamond membranes

Abstract

A method to fabricate nanoporous diamond membranes and a nanoporous diamond membrane are provided. A silicon substrate is provided and an optical lithography is used to produce metal dots on the silicon substrate with a predefined spacing between the dots. Selective seeding of the silicon wafer with nanodiamond solution in water is performed followed by controlled lateral diamond film growth producing the nanoporous diamond membrane. Back etching of the under laying silicon is performed to open nanopores in the produced nanoporous diamond membrane.

Inventors:
Issue Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1531907
Patent Number(s):
8673164
Application Number:
13/248,074
Assignee:
UChicago Argonne, LLC (Chicago, IL)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Patent
Resource Relation:
Patent File Date: 2011-09-29
Country of Publication:
United States
Language:
English

Citation Formats

Sumant, Anirudha V. Simple method to fabricate nano-porous diamond membranes. United States: N. p., 2014. Web.
Sumant, Anirudha V. Simple method to fabricate nano-porous diamond membranes. United States.
Sumant, Anirudha V. Tue . "Simple method to fabricate nano-porous diamond membranes". United States. https://www.osti.gov/servlets/purl/1531907.
@article{osti_1531907,
title = {Simple method to fabricate nano-porous diamond membranes},
author = {Sumant, Anirudha V.},
abstractNote = {A method to fabricate nanoporous diamond membranes and a nanoporous diamond membrane are provided. A silicon substrate is provided and an optical lithography is used to produce metal dots on the silicon substrate with a predefined spacing between the dots. Selective seeding of the silicon wafer with nanodiamond solution in water is performed followed by controlled lateral diamond film growth producing the nanoporous diamond membrane. Back etching of the under laying silicon is performed to open nanopores in the produced nanoporous diamond membrane.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 18 00:00:00 EDT 2014},
month = {Tue Mar 18 00:00:00 EDT 2014}
}

Works referenced in this record:

Method for Manufacturing a Porous Synthetic Diamond Material
patent-application, June 2013


Methods for Making a Microporous Membrane
patent-application, January 2010


Particle Filter and Manufacturing Method Therefor
patent-application, May 2012


Conductivity sensor device comprising diamond film with at least one nanopore or micorpore
patent-application, May 2011