Simple method to fabricate nano-porous diamond membranes
Abstract
A method to fabricate nanoporous diamond membranes and a nanoporous diamond membrane are provided. A silicon substrate is provided and an optical lithography is used to produce metal dots on the silicon substrate with a predefined spacing between the dots. Selective seeding of the silicon wafer with nanodiamond solution in water is performed followed by controlled lateral diamond film growth producing the nanoporous diamond membrane. Back etching of the under laying silicon is performed to open nanopores in the produced nanoporous diamond membrane.
- Inventors:
- Issue Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1531907
- Patent Number(s):
- 8673164
- Application Number:
- 13/248,074
- Assignee:
- UChicago Argonne, LLC (Chicago, IL)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- AC02-06CH11357
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2011-09-29
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Sumant, Anirudha V. Simple method to fabricate nano-porous diamond membranes. United States: N. p., 2014.
Web.
Sumant, Anirudha V. Simple method to fabricate nano-porous diamond membranes. United States.
Sumant, Anirudha V. Tue .
"Simple method to fabricate nano-porous diamond membranes". United States. https://www.osti.gov/servlets/purl/1531907.
@article{osti_1531907,
title = {Simple method to fabricate nano-porous diamond membranes},
author = {Sumant, Anirudha V.},
abstractNote = {A method to fabricate nanoporous diamond membranes and a nanoporous diamond membrane are provided. A silicon substrate is provided and an optical lithography is used to produce metal dots on the silicon substrate with a predefined spacing between the dots. Selective seeding of the silicon wafer with nanodiamond solution in water is performed followed by controlled lateral diamond film growth producing the nanoporous diamond membrane. Back etching of the under laying silicon is performed to open nanopores in the produced nanoporous diamond membrane.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 18 00:00:00 EDT 2014},
month = {Tue Mar 18 00:00:00 EDT 2014}
}
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