Thermal evaporation sources for wide-area deposition
Abstract
A thermal evaporation source includes: a crucible configured to contain a volume of evaporant and a vapor space above the evaporant; a manifold body having within it a hollow expansion chamber that is flowably connected to the vapor space via one or more restriction orifices; one or more effusion nozzles flowably connected to the expansion chamber and exiting an outer surface of the thermal evaporation source, the nozzle(s) oriented to direct an evaporant vapor flow out of the source vertically downward, in one or more horizontal directions, or in one or more directions intermediate between horizontal and vertically downward; and a heater capable of heating some or all of the thermal evaporation source to a temperature sufficient to produce the one or more evaporant vapor flows when a vacuum is applied to the thermal evaporation source.
- Inventors:
- Issue Date:
- Research Org.:
- JLN Solar, Inc., Mill Valley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1531797
- Patent Number(s):
- 8986455
- Application Number:
- 12/250,172
- Assignee:
- JLN Solar, Inc. (Mill Valley, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
F - MECHANICAL ENGINEERING F27 - FURNACES F27B - FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL
- DOE Contract Number:
- ADJ-1-30630-12
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2008-10-13
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Birkmire, Robert W., and Hanket, Gregory M. Thermal evaporation sources for wide-area deposition. United States: N. p., 2015.
Web.
Birkmire, Robert W., & Hanket, Gregory M. Thermal evaporation sources for wide-area deposition. United States.
Birkmire, Robert W., and Hanket, Gregory M. Tue .
"Thermal evaporation sources for wide-area deposition". United States. https://www.osti.gov/servlets/purl/1531797.
@article{osti_1531797,
title = {Thermal evaporation sources for wide-area deposition},
author = {Birkmire, Robert W. and Hanket, Gregory M.},
abstractNote = {A thermal evaporation source includes: a crucible configured to contain a volume of evaporant and a vapor space above the evaporant; a manifold body having within it a hollow expansion chamber that is flowably connected to the vapor space via one or more restriction orifices; one or more effusion nozzles flowably connected to the expansion chamber and exiting an outer surface of the thermal evaporation source, the nozzle(s) oriented to direct an evaporant vapor flow out of the source vertically downward, in one or more horizontal directions, or in one or more directions intermediate between horizontal and vertically downward; and a heater capable of heating some or all of the thermal evaporation source to a temperature sufficient to produce the one or more evaporant vapor flows when a vacuum is applied to the thermal evaporation source.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 24 00:00:00 EDT 2015},
month = {Tue Mar 24 00:00:00 EDT 2015}
}
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Works referencing / citing this record:
Thermal evaporation sources for wide-area deposition
patent, August 2017
- Birkmire, Robert W.; Hanket, Gregory M.
- US Patent Document 9,726,430