Localized atmospheric laser chemical vapor deposition
Abstract
An atmospheric, Laser-based Chemical Vapor Deposition (LCVD) technique provides highly localized deposition of material to mitigate damage sites on an optical component. The same laser beam can be used to deposit material as well as for in-situ annealing of the deposited material. The net result of the LCVD process is in-filling and planarization of a treated site, which produces optically more damage resistant surfaces. Several deposition and annealing steps can be interleaved during a single cycle for more precise control on amount of deposited material as well as for increasing the damage threshold for the deposited material.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1503530
- Patent Number(s):
- 10208377
- Application Number:
- 14/389,709
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B05 - SPRAYING OR ATOMISING IN GENERAL B05D - PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
- DOE Contract Number:
- AC52-07NA27344
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 2013 Apr 19
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Matthews, Manyalibo Joseph, and Elhadj, Selim. Localized atmospheric laser chemical vapor deposition. United States: N. p., 2019.
Web.
Matthews, Manyalibo Joseph, & Elhadj, Selim. Localized atmospheric laser chemical vapor deposition. United States.
Matthews, Manyalibo Joseph, and Elhadj, Selim. Tue .
"Localized atmospheric laser chemical vapor deposition". United States. https://www.osti.gov/servlets/purl/1503530.
@article{osti_1503530,
title = {Localized atmospheric laser chemical vapor deposition},
author = {Matthews, Manyalibo Joseph and Elhadj, Selim},
abstractNote = {An atmospheric, Laser-based Chemical Vapor Deposition (LCVD) technique provides highly localized deposition of material to mitigate damage sites on an optical component. The same laser beam can be used to deposit material as well as for in-situ annealing of the deposited material. The net result of the LCVD process is in-filling and planarization of a treated site, which produces optically more damage resistant surfaces. Several deposition and annealing steps can be interleaved during a single cycle for more precise control on amount of deposited material as well as for increasing the damage threshold for the deposited material.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Feb 19 00:00:00 EST 2019},
month = {Tue Feb 19 00:00:00 EST 2019}
}
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