Title: Self-assembled monolayer and method of making

Abstract

According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

Inventors:

Fryxell, Glen E.; Zemanian, Thomas S.; Liu, Jun; Shin, Yongsoon

Issue Date:

Tue May 11 00:00:00 EDT 2004

Research Org.:

Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)

Sponsoring Org.:

USDOE

OSTI Identifier:

1174840

Patent Number(s):

6733835

Application Number:

10/347,040

Assignee:

Battelle Memorial Institute (Richland, WA)

Patent Classifications (CPCs):

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY

B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES

Show more

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY

B01J2229/12 - to alter the outside of the crystallites, e.g. selectivation
B01J2229/32 - Reaction with silicon compounds, e.g. TEOS, siliconfluoride
B01J29/0308 - {Mesoporous materials not having base exchange properties, e.g. Si-MCM-41}
B01J29/06 - Crystalline aluminosilicate zeolites
B01J29/70 - of types characterised by their specific structure not provided for in groups B01J29/08 - B01J29/65
B01J29/7007 - {Zeolite Beta}
B01J29/80 - Mixtures of different zeolites
B01J31/0274 - {containing silicon
B01J35/002 - {Catalysts characterised by their physical properties}
B01J37/00 - Processes, in general, for preparing catalysts

B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES

B82Y30/00 - Nanotechnology for materials or surface science, e.g. nanocomposites
B82Y40/00 - Manufacture or treatment of nanostructures

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

Y10T428/249955 - Void-containing component partially impregnated with adjacent component
Y10T428/249956 - Void-containing component is inorganic
Y10T428/249969 - Of silicon-containing material [e.g., glass, etc.]
Y10T428/261 - In terms of molecular thickness or light wave length
Y10T428/2995 - Silane, siloxane or silicone coating
Y10T428/2996 - Glass particles or spheres
Y10T428/31663 - As siloxane, silicone or silane

Show less

DOE Contract Number:  

AC06-76RL01830

Resource Type:

Patent

Country of Publication:

United States

Language:

English

Subject:

36 MATERIALS SCIENCE