Nanopatterns by phase separation of patterned mixed polymer monolayers
Abstract
Micron-size and sub-micron-size patterns on a substrate can direct the self-assembly of surface-bonded mixed polymer brushes to create nanoscale patterns in the phase-separated mixed polymer brush. The larger scale features, or patterns, can be defined by a variety of lithographic techniques, as well as other physical and chemical processes including but not limited to etching, grinding, and polishing. The polymer brushes preferably comprise vinyl polymers, such as polystyrene and poly(methyl methacrylate).
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1124793
- Patent Number(s):
- 8652768
- Application Number:
- 13/361,228
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 77 NANOSCIENCE AND NANOTECHNOLOGY
Citation Formats
Huber, Dale L, and Frischknecht, Amalie. Nanopatterns by phase separation of patterned mixed polymer monolayers. United States: N. p., 2014.
Web.
Huber, Dale L, & Frischknecht, Amalie. Nanopatterns by phase separation of patterned mixed polymer monolayers. United States.
Huber, Dale L, and Frischknecht, Amalie. Tue .
"Nanopatterns by phase separation of patterned mixed polymer monolayers". United States. https://www.osti.gov/servlets/purl/1124793.
@article{osti_1124793,
title = {Nanopatterns by phase separation of patterned mixed polymer monolayers},
author = {Huber, Dale L and Frischknecht, Amalie},
abstractNote = {Micron-size and sub-micron-size patterns on a substrate can direct the self-assembly of surface-bonded mixed polymer brushes to create nanoscale patterns in the phase-separated mixed polymer brush. The larger scale features, or patterns, can be defined by a variety of lithographic techniques, as well as other physical and chemical processes including but not limited to etching, grinding, and polishing. The polymer brushes preferably comprise vinyl polymers, such as polystyrene and poly(methyl methacrylate).},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Feb 18 00:00:00 EST 2014},
month = {Tue Feb 18 00:00:00 EST 2014}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
Process for preparing a patterned continuous polymeric brush on a substrate surface
patent, July 2002
- Hawker, Craig J.; Hedrick, James L.; Hinsberg, William D.
- US Patent Document 6,423,465
Surface modification of substrates
patent, April 2006
- Luzinov, Igor; Swaminatha Iyer, Killugudi L.; Klep, Viktor Z.
- US Patent Document 7,026,014
Surface modification of substrates
patent, August 2007
- Luzinov, Igor; Swaminatha Iyer, Killugudi L.; Klep, Viktor Z.
- US Patent Document 7,261,938
Pattern forming method and substance adherence pattern material
patent, July 2008
- Kawamura, Koichi; Kano, Takeyoshi
- US Patent Document 7,405,035
Formation of a device using block copolymer lithography
patent, September 2012
- Xiao, Shuaigang; Yang, XiaoMin
- US Patent Document 8,268,545