Title: Method of making nanopatterns and nanostructures and nanopatterned functional oxide materials

Abstract

Method for nanopatterning of inorganic materials, such as ceramic (e.g. metal oxide) materials, and organic materials, such as polymer materials, on a variety of substrates to form nanopatterns and/or nanostructures with control of dimensions and location, all without the need for etching the materials and without the need for re-alignment between multiple patterning steps in forming nanostructures, such as heterostructures comprising multiple materials. The method involves patterning a resist-coated substrate using electron beam lithography, removing a portion of the resist to provide a patterned resist-coated substrate, and spin coating the patterned resist-coated substrate with a liquid precursor, such as a sol precursor, of the inorganic or organic material. The remaining resist is removed and the spin coated substrate is heated at an elevated temperature to crystallize the deposited precursor material.

Inventors:

Dravid, Vinayak P; Donthu, Suresh K; Pan, Zixiao

Issue Date:

Tue Feb 11 00:00:00 EST 2014

Research Org.:

Northwestern University, Evanston, IL, USA

Sponsoring Org.:

USDOE

OSTI Identifier:

1120121

Patent Number(s):

8647814

Application Number:

11/805,546

Assignee:

Northwestern University (Evanston, IL)

Patent Classifications (CPCs):

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES

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G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

G03F7/405 - {Treatment with inorganic or organometallic reagents after imagewise removal}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES

H01L21/0272 - {for lift-off processes}
H01L21/0277 - {Electrolithographic processes}
H01L21/31144 - {using masks}

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

Y10T428/24802 - Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

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DOE Contract Number:  

W-31-109-ENG-38

Resource Type:

Patent

Country of Publication:

United States

Language:

English

Subject:

77 NANOSCIENCE AND NANOTECHNOLOGY