DOE Patents title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Rapid thermal processing by stamping

Abstract

A rapid thermal processing device and methods are provided for thermal processing of samples such as semiconductor wafers. The device has components including a stamp (35) having a stamping surface and a heater or cooler (40) to bring it to a selected processing temperature, a sample holder (20) for holding a sample (10) in position for intimate contact with the stamping surface; and positioning components (25) for moving the stamping surface and the stamp (35) in and away from intimate, substantially non-pressured contact. Methods for using and making such devices are also provided. These devices and methods allow inexpensive, efficient, easily controllable thermal processing.

Inventors:
;
Issue Date:
Research Org.:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1083459
Patent Number(s):
8389422
Application Number:
12/675,117
Assignee:
Alliance for Sustainable Energy, LLC (Golden, CO)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
DOE Contract Number:  
AC36-99G010337
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 42 ENGINEERING

Citation Formats

Stradins, Pauls, and Wang, Qi. Rapid thermal processing by stamping. United States: N. p., 2013. Web.
Stradins, Pauls, & Wang, Qi. Rapid thermal processing by stamping. United States.
Stradins, Pauls, and Wang, Qi. Tue . "Rapid thermal processing by stamping". United States. https://www.osti.gov/servlets/purl/1083459.
@article{osti_1083459,
title = {Rapid thermal processing by stamping},
author = {Stradins, Pauls and Wang, Qi},
abstractNote = {A rapid thermal processing device and methods are provided for thermal processing of samples such as semiconductor wafers. The device has components including a stamp (35) having a stamping surface and a heater or cooler (40) to bring it to a selected processing temperature, a sample holder (20) for holding a sample (10) in position for intimate contact with the stamping surface; and positioning components (25) for moving the stamping surface and the stamp (35) in and away from intimate, substantially non-pressured contact. Methods for using and making such devices are also provided. These devices and methods allow inexpensive, efficient, easily controllable thermal processing.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 05 00:00:00 EST 2013},
month = {Tue Mar 05 00:00:00 EST 2013}
}

Works referenced in this record:

Speaker adapted to corner-loaded installation
patent, February 1986


Solid phase crystallization of thin films of Si prepared by plasma‐enhanced chemical vapor deposition
journal, July 1993


Method for heating and cooling substrates
patent, December 2003


Light management film with colorant receiving layer
patent, November 2004


Thermal stamping apparatus
patent, December 1980


Thermal stamping device
patent, April 1981


Pressure controlled heat source and method for using such for RTP
patent, May 2004