Nanostructure templating using low temperature atomic layer deposition
Abstract
Methods are described for making nanostructures that are mechanically, chemically and thermally stable at desired elevated temperatures, from nanostructure templates having a stability temperature that is less than the desired elevated temperature. The methods comprise depositing by atomic layer deposition (ALD) structural layers that are stable at the desired elevated temperatures, onto a template employing a graded temperature deposition scheme. At least one structural layer is deposited at an initial temperature that is less than or equal to the stability temperature of the template, and subsequent depositions made at incrementally increased deposition temperatures until the desired elevated temperature stability is achieved. Nanostructure templates include three dimensional (3D) polymeric templates having features on the order of 100 nm fabricated by proximity field nanopatterning (PnP) methods.
- Inventors:
-
- Albuquerque, NM
- Corrales, NM
- Champaign, IL
- Issue Date:
- Research Org.:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1034170
- Patent Number(s):
- 8080280
- Application Number:
- 11/872,749
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 77 NANOSCIENCE AND NANOTECHNOLOGY
Citation Formats
Grubbs, Robert K, Bogart, Gregory R, and Rogers, John A. Nanostructure templating using low temperature atomic layer deposition. United States: N. p., 2011.
Web.
Grubbs, Robert K, Bogart, Gregory R, & Rogers, John A. Nanostructure templating using low temperature atomic layer deposition. United States.
Grubbs, Robert K, Bogart, Gregory R, and Rogers, John A. Tue .
"Nanostructure templating using low temperature atomic layer deposition". United States. https://www.osti.gov/servlets/purl/1034170.
@article{osti_1034170,
title = {Nanostructure templating using low temperature atomic layer deposition},
author = {Grubbs, Robert K and Bogart, Gregory R and Rogers, John A},
abstractNote = {Methods are described for making nanostructures that are mechanically, chemically and thermally stable at desired elevated temperatures, from nanostructure templates having a stability temperature that is less than the desired elevated temperature. The methods comprise depositing by atomic layer deposition (ALD) structural layers that are stable at the desired elevated temperatures, onto a template employing a graded temperature deposition scheme. At least one structural layer is deposited at an initial temperature that is less than or equal to the stability temperature of the template, and subsequent depositions made at incrementally increased deposition temperatures until the desired elevated temperature stability is achieved. Nanostructure templates include three dimensional (3D) polymeric templates having features on the order of 100 nm fabricated by proximity field nanopatterning (PnP) methods.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Dec 20 00:00:00 EST 2011},
month = {Tue Dec 20 00:00:00 EST 2011}
}
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