Planar controlled zone microwave plasma system
Abstract
An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.
- Inventors:
-
- Knoxville, TN
- Oak Ridge, TN
- Knoxvlle, TN
- Issue Date:
- Research Org.:
- Oak Ridge Y-12 Plant (Y-12), Oak Ridge, TN (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1029315
- Patent Number(s):
- 8028654
- Application Number:
- 12/555,459
- Assignee:
- Babcock & Wilcox Technical Services Y-12, LLC (Oak Ridge, TN)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC05-00OR22800
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 70 PLASMA PHYSICS AND FUSION TECHNOLOGY
Citation Formats
Ripley, Edward B, Seals, Roland D, and Morrell, Jonathan S. Planar controlled zone microwave plasma system. United States: N. p., 2011.
Web.
Ripley, Edward B, Seals, Roland D, & Morrell, Jonathan S. Planar controlled zone microwave plasma system. United States.
Ripley, Edward B, Seals, Roland D, and Morrell, Jonathan S. Tue .
"Planar controlled zone microwave plasma system". United States. https://www.osti.gov/servlets/purl/1029315.
@article{osti_1029315,
title = {Planar controlled zone microwave plasma system},
author = {Ripley, Edward B and Seals, Roland D and Morrell, Jonathan S},
abstractNote = {An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Oct 04 00:00:00 EDT 2011},
month = {Tue Oct 04 00:00:00 EDT 2011}
}
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