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Title: Adhesive particle shielding

Abstract

An efficient device for capturing fast moving particles has an adhesive particle shield that includes (i) a mounting panel and (ii) a film that is attached to the mounting panel wherein the outer surface of the film has an adhesive coating disposed thereon to capture particles contacting the outer surface. The shield can be employed to maintain a substantially particle free environment such as in photolithographic systems having critical surfaces, such as wafers, masks, and optics and in the tools used to make these components, that are sensitive to particle contamination. The shield can be portable to be positioned in hard-to-reach areas of a photolithography machine. The adhesive particle shield can incorporate cooling means to attract particles via the thermophoresis effect.

Inventors:
 [1];  [2];  [3];  [4]
  1. Dublin, CA
  2. Albuquerque, NM
  3. Berkeley, CA
  4. Livermore, CA
Issue Date:
Research Org.:
National Nuclear Security Agency Service Center
Sponsoring Org.:
USDOE
OSTI Identifier:
985861
Patent Number(s):
7,473,301
Application Number:
10/245,218
Assignee:
EUV LLC (Santa Clara, CA)
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Klebanoff, Leonard Elliott, Rader, Daniel John, Walton, Christopher, and Folta, James. Adhesive particle shielding. United States: N. p., 2009. Web.
Klebanoff, Leonard Elliott, Rader, Daniel John, Walton, Christopher, & Folta, James. Adhesive particle shielding. United States.
Klebanoff, Leonard Elliott, Rader, Daniel John, Walton, Christopher, and Folta, James. Tue . "Adhesive particle shielding". United States. https://www.osti.gov/servlets/purl/985861.
@article{osti_985861,
title = {Adhesive particle shielding},
author = {Klebanoff, Leonard Elliott and Rader, Daniel John and Walton, Christopher and Folta, James},
abstractNote = {An efficient device for capturing fast moving particles has an adhesive particle shield that includes (i) a mounting panel and (ii) a film that is attached to the mounting panel wherein the outer surface of the film has an adhesive coating disposed thereon to capture particles contacting the outer surface. The shield can be employed to maintain a substantially particle free environment such as in photolithographic systems having critical surfaces, such as wafers, masks, and optics and in the tools used to make these components, that are sensitive to particle contamination. The shield can be portable to be positioned in hard-to-reach areas of a photolithography machine. The adhesive particle shield can incorporate cooling means to attract particles via the thermophoresis effect.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2009},
month = {1}
}

Patent:

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