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Title: Apparatus and method for electrical insulation in plasma discharge systems

Abstract

An apparatus and method to contain plasma at optimal fill capacity of a metallic container is disclosed. The invention includes the utilization of anodized layers forming the internal surfaces of the container volume. Bias resistors are calibrated to provide constant current at variable voltage conditions. By choosing the appropriate values of the bias resistors, the voltages of the metallic container relative to the voltage of an anode are adjusted to achieve optimal plasma fill while minimizing the chance of reaching the breakdown voltage of the anodized layer.

Inventors:
 [1];  [2]
  1. Redwood City, CA
  2. Livermore, CA
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
985340
Patent Number(s):
6,605,901
Application Number:
10/038,386
Assignee:
The United States of America as represented by the Department of Energy (Washington, DC) OAK
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Rhodes, Mark A, and Fochs, Scott N. Apparatus and method for electrical insulation in plasma discharge systems. United States: N. p., 2003. Web.
Rhodes, Mark A, & Fochs, Scott N. Apparatus and method for electrical insulation in plasma discharge systems. United States.
Rhodes, Mark A, and Fochs, Scott N. Tue . "Apparatus and method for electrical insulation in plasma discharge systems". United States. https://www.osti.gov/servlets/purl/985340.
@article{osti_985340,
title = {Apparatus and method for electrical insulation in plasma discharge systems},
author = {Rhodes, Mark A and Fochs, Scott N},
abstractNote = {An apparatus and method to contain plasma at optimal fill capacity of a metallic container is disclosed. The invention includes the utilization of anodized layers forming the internal surfaces of the container volume. Bias resistors are calibrated to provide constant current at variable voltage conditions. By choosing the appropriate values of the bias resistors, the voltages of the metallic container relative to the voltage of an anode are adjusted to achieve optimal plasma fill while minimizing the chance of reaching the breakdown voltage of the anodized layer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {8}
}

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