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Title: Methods of making monolayers

Abstract

The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.

Inventors:
 [1];  [2];  [3];  [3];  [4];  [3];  [2]
  1. Pasco, WA
  2. Kennewick, WA
  3. Richland, WA
  4. Albuquerque, NM
Issue Date:
Research Org.:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
982372
Patent Number(s):
7588798
Application Number:
11/433,315
Assignee:
Battelle Memorial Institute (Richland, WA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B - PERFORMING OPERATIONS B05 - SPRAYING OR ATOMISING IN GENERAL B05D - PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Alford, Kentin L, Simmons, Kevin L, Samuels, William D, Zemanian, Thomas S, Liu, Jun, Shin, Yongsoon, and Fryxell, Glen E. Methods of making monolayers. United States: N. p., 2009. Web.
Alford, Kentin L, Simmons, Kevin L, Samuels, William D, Zemanian, Thomas S, Liu, Jun, Shin, Yongsoon, & Fryxell, Glen E. Methods of making monolayers. United States.
Alford, Kentin L, Simmons, Kevin L, Samuels, William D, Zemanian, Thomas S, Liu, Jun, Shin, Yongsoon, and Fryxell, Glen E. Tue . "Methods of making monolayers". United States. https://www.osti.gov/servlets/purl/982372.
@article{osti_982372,
title = {Methods of making monolayers},
author = {Alford, Kentin L and Simmons, Kevin L and Samuels, William D and Zemanian, Thomas S and Liu, Jun and Shin, Yongsoon and Fryxell, Glen E},
abstractNote = {The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2009},
month = {9}
}

Works referenced in this record:

Deposition of Self-Assembled Monolayers in Mesoporous Silica from Supercritical Fluids
journal, December 2001


Supercritical processing of functionalized size selective microporous materials
journal, May 2000


Functionalized Monolayers on Ordered Mesoporous Supports
journal, May 1997