Microelectromechanical resonator and method for fabrication
Abstract
A method is disclosed for the robust fabrication of a microelectromechanical (MEM) resonator. In this method, a pattern of holes is formed in the resonator mass with the position, size and number of holes in the pattern being optimized to minimize an uncertainty .DELTA.f in the resonant frequency f.sub.0 of the MEM resonator due to manufacturing process variations (e.g. edge bias). A number of different types of MEM resonators are disclosed which can be formed using this method, including capacitively transduced Lame, wineglass and extensional resonators, and piezoelectric length-extensional resonators.
- Inventors:
-
- Albuquerque, NM
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 971523
- Patent Number(s):
- 7616077
- Application Number:
- 11/689,567
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
H - ELECTRICITY H03 - BASIC ELECTRONIC CIRCUITRY H03H - IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Wittwer, Jonathan W, and Olsson, Roy H. Microelectromechanical resonator and method for fabrication. United States: N. p., 2009.
Web.
Wittwer, Jonathan W, & Olsson, Roy H. Microelectromechanical resonator and method for fabrication. United States.
Wittwer, Jonathan W, and Olsson, Roy H. Tue .
"Microelectromechanical resonator and method for fabrication". United States. https://www.osti.gov/servlets/purl/971523.
@article{osti_971523,
title = {Microelectromechanical resonator and method for fabrication},
author = {Wittwer, Jonathan W and Olsson, Roy H},
abstractNote = {A method is disclosed for the robust fabrication of a microelectromechanical (MEM) resonator. In this method, a pattern of holes is formed in the resonator mass with the position, size and number of holes in the pattern being optimized to minimize an uncertainty .DELTA.f in the resonant frequency f.sub.0 of the MEM resonator due to manufacturing process variations (e.g. edge bias). A number of different types of MEM resonators are disclosed which can be formed using this method, including capacitively transduced Lame, wineglass and extensional resonators, and piezoelectric length-extensional resonators.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 10 00:00:00 EST 2009},
month = {Tue Nov 10 00:00:00 EST 2009}
}
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Works referenced in this record:
Robust Design and Model Validation of Nonlinear Compliant Micromechanisms
journal, February 2006
- Wittwer, J. W.; Baker, M. S.; Howell, L. L.
- Journal of Microelectromechanical Systems, Vol. 15, Issue 1
MEMS resonators that are robust to process-induced feature width variations
journal, October 2002
- Liu, Rong; Paden, B.; Turner, K.
- Journal of Microelectromechanical Systems, Vol. 11, Issue 5, p. 505-511
Square-Extensional Mode Single-Crystal Silicon Micromechanical Resonator for Low-Phase-Noise Oscillator Applications
journal, April 2004
- Kaajakari, V.; Mattila, T.; Oja, A.
- IEEE Electron Device Letters, Vol. 25, Issue 4
A sub-micron capacitive gap process for multiple-metal-electrode lateral micromechanical resonators
conference, January 2001
- Hsu, W. -T.; Clark, J. R.; Nguyen, C. T. -C.
- Technical Digest MEMS 2001 14th IEEE International Conference on Micro Electro Mechanical Systems, Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090)
Design of microresonators under uncertainty
journal, February 2005
- Mawardi, A.; Pitchumani, R.
- Journal of Microelectromechanical Systems, Vol. 14, Issue 1