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Title: Microelectromechanical resonator and method for fabrication

Abstract

A method is disclosed for the robust fabrication of a microelectromechanical (MEM) resonator. In this method, a pattern of holes is formed in the resonator mass with the position, size and number of holes in the pattern being optimized to minimize an uncertainty .DELTA.f in the resonant frequency f.sub.0 of the MEM resonator due to manufacturing process variations (e.g. edge bias). A number of different types of MEM resonators are disclosed which can be formed using this method, including capacitively transduced Lame, wineglass and extensional resonators, and piezoelectric length-extensional resonators.

Inventors:
 [1];  [1]
  1. Albuquerque, NM
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
971523
Patent Number(s):
7616077
Application Number:
11/689,567
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
H - ELECTRICITY H03 - BASIC ELECTRONIC CIRCUITRY H03H - IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Wittwer, Jonathan W, and Olsson, Roy H. Microelectromechanical resonator and method for fabrication. United States: N. p., 2009. Web.
Wittwer, Jonathan W, & Olsson, Roy H. Microelectromechanical resonator and method for fabrication. United States.
Wittwer, Jonathan W, and Olsson, Roy H. Tue . "Microelectromechanical resonator and method for fabrication". United States. https://www.osti.gov/servlets/purl/971523.
@article{osti_971523,
title = {Microelectromechanical resonator and method for fabrication},
author = {Wittwer, Jonathan W and Olsson, Roy H},
abstractNote = {A method is disclosed for the robust fabrication of a microelectromechanical (MEM) resonator. In this method, a pattern of holes is formed in the resonator mass with the position, size and number of holes in the pattern being optimized to minimize an uncertainty .DELTA.f in the resonant frequency f.sub.0 of the MEM resonator due to manufacturing process variations (e.g. edge bias). A number of different types of MEM resonators are disclosed which can be formed using this method, including capacitively transduced Lame, wineglass and extensional resonators, and piezoelectric length-extensional resonators.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2009},
month = {11}
}

Works referenced in this record:

Robust Design and Model Validation of Nonlinear Compliant Micromechanisms
journal, February 2006


Square-Extensional Mode Single-Crystal Silicon Micromechanical Resonator for Low-Phase-Noise Oscillator Applications
journal, April 2004


A sub-micron capacitive gap process for multiple-metal-electrode lateral micromechanical resonators
conference, January 2001

  • Hsu, W. -T.; Clark, J. R.; Nguyen, C. T. -C.
  • Technical Digest MEMS 2001 14th IEEE International Conference on Micro Electro Mechanical Systems, Technical Digest. MEMS 2001. 14th IEEE International Conference on Micro Electro Mechanical Systems (Cat. No.01CH37090)
  • https://doi.org/10.1109/MEMSYS.2001.906550

Design of microresonators under uncertainty
journal, February 2005