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Title: Microfabricated diffusion source

Abstract

A microfabricated diffusion source to provide for a controlled diffusion rate of a vapor comprises a porous reservoir formed in a substrate that can be filled with a liquid, a headspace cavity for evaporation of the vapor therein, a diffusion channel to provide a controlled diffusion of the vapor, and an outlet to release the vapor into a gas stream. The microfabricated diffusion source can provide a calibration standard for a microanalytical system. The microanalytical system with an integral diffusion source can be fabricated with microelectromechanical systems technologies.

Inventors:
 [1];  [2];  [1]
  1. Albuquerque, NM
  2. Cedar Crest, NM
Issue Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
941682
Patent Number(s):
7399449
Application Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01L - CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Oborny, Michael C, Frye-Mason, Gregory C, and Manginell, Ronald P. Microfabricated diffusion source. United States: N. p., 2008. Web.
Oborny, Michael C, Frye-Mason, Gregory C, & Manginell, Ronald P. Microfabricated diffusion source. United States.
Oborny, Michael C, Frye-Mason, Gregory C, and Manginell, Ronald P. Tue . "Microfabricated diffusion source". United States. https://www.osti.gov/servlets/purl/941682.
@article{osti_941682,
title = {Microfabricated diffusion source},
author = {Oborny, Michael C and Frye-Mason, Gregory C and Manginell, Ronald P},
abstractNote = {A microfabricated diffusion source to provide for a controlled diffusion rate of a vapor comprises a porous reservoir formed in a substrate that can be filled with a liquid, a headspace cavity for evaporation of the vapor therein, a diffusion channel to provide a controlled diffusion of the vapor, and an outlet to release the vapor into a gas stream. The microfabricated diffusion source can provide a calibration standard for a microanalytical system. The microanalytical system with an integral diffusion source can be fabricated with microelectromechanical systems technologies.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2008},
month = {7}
}

Works referenced in this record:

The preparation of standard gas mixtures. A review
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Crystal orientation and electrolyte dependence for macropore nucleation and stable growth on p-type Si
journal, January 2000


Formation of High Aspect Ratio Macropore Array on p-Type Silicon
journal, January 1999


Generation of standard gaseous mixtures
journal, January 1984


Application of Diffusion Cells to Production of Known Concentration of Gaseous Hydrocarbons
journal, June 1960