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Title: Reactive ion etched substrates and methods of making and using

Abstract

Disclosed herein are substrates comprising reactive ion etched surfaces and specific binding agents immobilized thereon. The substrates may be used in methods and devices for assaying or isolating analytes in a sample. Also disclosed are methods of making the reactive ion etched surfaces.

Inventors:
 [1];  [2];  [1];  [3]
  1. San Francisco, CA
  2. Oakland, CA
  3. New York, NY
Issue Date:
Research Org.:
Sandia National Laboratories (SNL-NM), Albuquerque, NM
Sponsoring Org.:
USDOE
OSTI Identifier:
935039
Patent Number(s):
7,253,008
Assignee:
Sandia Corporation (Albuquerque, NM)
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

Rucker, Victor C, Shediac, Rene, Simmons, Blake A, and Havenstrite, Karen L. Reactive ion etched substrates and methods of making and using. United States: N. p., 2007. Web.
Rucker, Victor C, Shediac, Rene, Simmons, Blake A, & Havenstrite, Karen L. Reactive ion etched substrates and methods of making and using. United States.
Rucker, Victor C, Shediac, Rene, Simmons, Blake A, and Havenstrite, Karen L. Tue . "Reactive ion etched substrates and methods of making and using". United States. https://www.osti.gov/servlets/purl/935039.
@article{osti_935039,
title = {Reactive ion etched substrates and methods of making and using},
author = {Rucker, Victor C and Shediac, Rene and Simmons, Blake A and Havenstrite, Karen L},
abstractNote = {Disclosed herein are substrates comprising reactive ion etched surfaces and specific binding agents immobilized thereon. The substrates may be used in methods and devices for assaying or isolating analytes in a sample. Also disclosed are methods of making the reactive ion etched surfaces.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2007},
month = {8}
}

Patent:

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