Low-cost method for producing extreme ultraviolet lithography optics

Folta, James A; Montcalm, Claude; Taylor, John S; Spiller, Eberhard A

Title: Low-cost method for producing extreme ultraviolet lithography optics

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Abstract

Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

Inventors:

Folta, James A ^[1]; Montcalm, Claude ^[2]; Taylor, John S ^[1]; Spiller, Eberhard A ^[3]

Livermore, CA
Fort Collins, CO
Mt. Kisco, NY

Issue Date:: 2003-11-21

Research Org.:: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 921901

Patent Number(s):: 6634760

Application Number:: 09/940,099

Assignee:: The Regents of the University of California (Oakland, CA)

Patent Classifications (CPCs):: G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

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G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
G02B5/283 - {designed for the ultraviolet}

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
Y10T428/12632 - Four or more distinct components with alternate recurrence of each type component

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DOE Contract Number:: W-7405-ENG-48

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE

Citation Formats


                    Folta, James A, Montcalm, Claude, Taylor, John S, and Spiller, Eberhard A. Low-cost method for producing extreme ultraviolet lithography optics.  United States: N. p., 2003. 
        Web.

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                    Folta, James A, Montcalm, Claude, Taylor, John S, & Spiller, Eberhard A. Low-cost method for producing extreme ultraviolet lithography optics.  United States.

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                    Folta, James A, Montcalm, Claude, Taylor, John S, and Spiller, Eberhard A. Fri .  
        "Low-cost method for producing extreme ultraviolet lithography optics".  United States.  https://www.osti.gov/servlets/purl/921901.

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@article{osti_921901,

  title        = {Low-cost method for producing extreme ultraviolet lithography optics},

  author       = {Folta, James A and Montcalm, Claude and Taylor, John S and Spiller, Eberhard A},

  abstractNote = {Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2003},

  month        = {11}

}

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