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Title: Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy

Abstract

A method and system for producing a film (preferably a thin film with highly uniform or highly accurate custom graded thickness) on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source operated with time-varying flux distribution. In preferred embodiments, the source is operated with time-varying power applied thereto during each sweep of the substrate to achieve the time-varying flux distribution as a function of time. A user selects a source flux modulation recipe for achieving a predetermined desired thickness profile of the deposited film. The method relies on precise modulation of the deposition flux to which a substrate is exposed to provide a desired coating thickness distribution.

Inventors:
 [1];  [1];  [2];  [3]
  1. Livermore, CA
  2. San Jose, CA
  3. New City, NY
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
921900
Patent Number(s):
6425988
Application Number:
09/711,441
Assignee:
Montcalm, Claude (Livermore, CA); Folta, James Allen (Livermore, CA); Tan, Swie-In (San Jose, CA); Reiss, Ira (New City, NY
Patent Classifications (CPCs):
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
25 ENERGY STORAGE

Citation Formats

Montcalm, Claude, Folta, James Allen, Tan, Swie-In, and Reiss, Ira. Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy. United States: N. p., 2002. Web.
Montcalm, Claude, Folta, James Allen, Tan, Swie-In, & Reiss, Ira. Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy. United States.
Montcalm, Claude, Folta, James Allen, Tan, Swie-In, and Reiss, Ira. Tue . "Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy". United States. https://www.osti.gov/servlets/purl/921900.
@article{osti_921900,
title = {Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy},
author = {Montcalm, Claude and Folta, James Allen and Tan, Swie-In and Reiss, Ira},
abstractNote = {A method and system for producing a film (preferably a thin film with highly uniform or highly accurate custom graded thickness) on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source operated with time-varying flux distribution. In preferred embodiments, the source is operated with time-varying power applied thereto during each sweep of the substrate to achieve the time-varying flux distribution as a function of time. A user selects a source flux modulation recipe for achieving a predetermined desired thickness profile of the deposited film. The method relies on precise modulation of the deposition flux to which a substrate is exposed to provide a desired coating thickness distribution.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2002},
month = {7}
}

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Works referenced in this record:

Multilayer coating of 10X projection optics for extreme ultraviolet lithography
conference, June 1999


Advances in multilayer reflective coatings for extreme ultraviolet lithography
conference, June 1999


Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography
conference, June 1998


Design and performance of graded multilayers as focusing elements for x-ray optics
journal, August 1999