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Title: Magnetron sputtered boron films for increasing hardness of a metal surface

Abstract

A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.

Inventors:
 [1];  [1]
  1. Livermore, CA
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
921891
Patent Number(s):
6,569,293
Application Number:
08/871,705
Assignee:
The Regents of the University of California (Oakland, CA) OAK
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Makowiecki, Daniel M, and Jankowski, Alan F. Magnetron sputtered boron films for increasing hardness of a metal surface. United States: N. p., 2003. Web.
Makowiecki, Daniel M, & Jankowski, Alan F. Magnetron sputtered boron films for increasing hardness of a metal surface. United States.
Makowiecki, Daniel M, and Jankowski, Alan F. Tue . "Magnetron sputtered boron films for increasing hardness of a metal surface". United States. https://www.osti.gov/servlets/purl/921891.
@article{osti_921891,
title = {Magnetron sputtered boron films for increasing hardness of a metal surface},
author = {Makowiecki, Daniel M and Jankowski, Alan F},
abstractNote = {A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {5}
}

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