Combined plasma/liquid cleaning of substrates

Title: Combined plasma/liquid cleaning of substrates

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Abstract

Apparatus and method for cleaning substrates. A substrate is held and rotated by a chuck and an atmospheric pressure plasma jet places a plasma onto predetermined areas of the substrate. Subsequently liquid rinse is sprayed onto the predetermined areas. In one embodiment, a nozzle sprays a gas onto the predetermined areas to assist in drying the predetermined areas when needed.

Inventors:

Selwyn, Gary S ^[1]; Henins, Ivars ^[1]

Los Alamos, NM

Issue Date:: 2003-04-15

Research Org.:: Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 921358

Patent Number(s):: 6546938

Application Number:: 09/803,065

Assignee:: The Regents of the University of California (Los Alamos, NM)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES

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B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
B08B3/02 - Cleaning by the force of jets or sprays

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L21/67051 - {using mainly spraying means, e.g. nozzles}

Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10S - TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10S134/902 - Semiconductor wafer

B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
B08B7/0035 - {by radiant energy, e.g. UV, laser, light beam or the like}

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DOE Contract Number:: W-7405-ENG-36

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Citation Formats


                    Selwyn, Gary S, and Henins, Ivars. Combined plasma/liquid cleaning of substrates.  United States: N. p., 2003. 
        Web.

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                    Selwyn, Gary S, & Henins, Ivars. Combined plasma/liquid cleaning of substrates.  United States.

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                    Selwyn, Gary S, and Henins, Ivars. Tue .  
        "Combined plasma/liquid cleaning of substrates".  United States.  https://www.osti.gov/servlets/purl/921358.

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@article{osti_921358,

  title        = {Combined plasma/liquid cleaning of substrates},

  author       = {Selwyn, Gary S and Henins, Ivars},

  abstractNote = {Apparatus and method for cleaning substrates. A substrate is held and rotated by a chuck and an atmospheric pressure plasma jet places a plasma onto predetermined areas of the substrate. Subsequently liquid rinse is sprayed onto the predetermined areas. In one embodiment, a nozzle sprays a gas onto the predetermined areas to assist in drying the predetermined areas when needed.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2003},

  month        = {4}

}

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