Method of produce ultra-low friction carbon films
Abstract
A method and article of manufacture of amorphous diamond-like carbon. The method involves providing a substrate in a chamber, providing a mixture of a carbon containing gas and hydrogen gas with the mixture adjusted such that the atomic molar ratio of carbon to hydrogen is less than 0.3, including all carbon atoms and all hydrogen atoms in the mixture. A plasma is formed of the mixture and the amorphous diamond-like carbon film is deposited on the substrate. To achieve optimum bonding an intervening bonding layer, such as Si or SiO.sub.2, can be formed from SiH.sub.4 with or without oxidation of the layer formed.
- Inventors:
-
- Naperville, IL
- Downers Grove, IL
- Istanbul, TK
- Lemont, IL
- Issue Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 921345
- Patent Number(s):
- 6548173
- Application Number:
- 09/808,632
- Assignee:
- Argonne National Laboratory (Argonne, IL)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC Y10T - TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- DOE Contract Number:
- W-31109-ENG-38
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Erdemir, Ali, Fenske, George R, Eryilmaz, Osman Levent, and Lee, Richard H. Method of produce ultra-low friction carbon films. United States: N. p., 2003.
Web.
Erdemir, Ali, Fenske, George R, Eryilmaz, Osman Levent, & Lee, Richard H. Method of produce ultra-low friction carbon films. United States.
Erdemir, Ali, Fenske, George R, Eryilmaz, Osman Levent, and Lee, Richard H. Tue .
"Method of produce ultra-low friction carbon films". United States. https://www.osti.gov/servlets/purl/921345.
@article{osti_921345,
title = {Method of produce ultra-low friction carbon films},
author = {Erdemir, Ali and Fenske, George R and Eryilmaz, Osman Levent and Lee, Richard H},
abstractNote = {A method and article of manufacture of amorphous diamond-like carbon. The method involves providing a substrate in a chamber, providing a mixture of a carbon containing gas and hydrogen gas with the mixture adjusted such that the atomic molar ratio of carbon to hydrogen is less than 0.3, including all carbon atoms and all hydrogen atoms in the mixture. A plasma is formed of the mixture and the amorphous diamond-like carbon film is deposited on the substrate. To achieve optimum bonding an intervening bonding layer, such as Si or SiO.sub.2, can be formed from SiH.sub.4 with or without oxidation of the layer formed.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {4}
}
Save to My Library
You must Sign In or Create an Account in order to save documents to your library.
Works referenced in this record:
Processing and characterisation of diamondlike carbon films
journal, January 1997
- Zhang, S.; Wang, B.; Tang, J. Y.
- Surface Engineering, Vol. 13, Issue 4
Effect of source gas and deposition method on friction and wear performance of diamondlike carbon films
journal, October 1997
- Erdemir, A.; Fenske, G. R.; Terry, J.
- Surface and Coatings Technology, Vol. 94-95
The effect of TiN interlayers on the indentation behavior of diamond-like carbon films on alloy and compound substrates
journal, March 1994
- Cooper, C. V.; Holiday, P.; Matthews, A.
- Surface and Coatings Technology, Vol. 63, Issue 3
Interpretation of Raman spectra of disordered and amorphous carbon
journal, May 2000
- Ferrari, A. C.; Robertson, J.
- Physical Review B, Vol. 61, Issue 20, p. 14095-14107