Method to remove uranium/vanadium contamination from groundwater
Abstract
A process for removing uranium/vanadium-based contaminants from groundwater using a primary in-ground treatment media and a pretreatment media that chemically adjusts the groundwater contaminant to provide for optimum treatment by the primary treatment media.
- Inventors:
-
- DeBeque, CO
- Grand Junction, CO
- Issue Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 920041
- Patent Number(s):
- 6767468
- Application Number:
- 10/207,895
- Assignee:
- The United States of America as represented by the United States Department of Energy (Washington, DC)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C02 - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE C02F - TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Metzler, Donald R, and Morrison, Stanley. Method to remove uranium/vanadium contamination from groundwater. United States: N. p., 2004.
Web.
Metzler, Donald R, & Morrison, Stanley. Method to remove uranium/vanadium contamination from groundwater. United States.
Metzler, Donald R, and Morrison, Stanley. Tue .
"Method to remove uranium/vanadium contamination from groundwater". United States. https://www.osti.gov/servlets/purl/920041.
@article{osti_920041,
title = {Method to remove uranium/vanadium contamination from groundwater},
author = {Metzler, Donald R and Morrison, Stanley},
abstractNote = {A process for removing uranium/vanadium-based contaminants from groundwater using a primary in-ground treatment media and a pretreatment media that chemically adjusts the groundwater contaminant to provide for optimum treatment by the primary treatment media.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {7}
}
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Works referenced in this record:
New approach toin-situ treatment of contaminated groundwaters
journal, August 1985
- McMurtry, David C.; Elton, Richard O.
- Environmental Progress, Vol. 4, Issue 3